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| Interfacial and optical properties of YOxNy gate dielectrics at different deposition temperatures 期刊论文
journal of physics d: applied physics, 2009, 期号: 42
X J Wang; L D Zhang; G He; L Q Zhu; M Liu; J P Zhang
  收藏 | 浏览/下载：21/0 | 提交时间：2010/02/26 |
| Thickness-modulated optical dielectric constants and band alignments of HfOxNy gate dielectrics 期刊论文
journal of applied physics, 2009, 期号: 105
G. He; L. D. Zhang; M. Liu; J. P. Zhang; X. J. Wang; C. M. Zhen
收藏 | 浏览/下载：5/0 | 提交时间：2010/03/18 |
| Effect of thermal treatment on the band offsets and interfacial properties of HfOxNy gate dielectrics 期刊论文
j. phys. d: appl. phys., 2009, 期号: 42
作者: Q Fang
收藏 | 浏览/下载：18/0 | 提交时间：2010/02/02 |
| Structural and optical properties of nitrogen-incorporated HfO2 gate dielectrics deposited by reactive sputtering 期刊论文
applied surface science, 2007, 期号: 253
G. He; Q. Fang; G.H. Li; J.P. Zhang; L.D. Zhang
收藏 | 浏览/下载：9/0 | 提交时间：2010/07/16 |
| Characterization of HfOxNy gate dielectrics using a hafnium oxide as target 期刊论文
applied surface science, 2006, 期号: 252
M. Liu; Q. Fang; G. He; L.Q. Zhu; L.D. Zhang
收藏 | 浏览/下载：19/0 | 提交时间：2010/07/20 |
| Spectroscopic ellipsometry characterization of nitrogen-incorporated HfO2 gate dielectrics grown by radio-frequency reactive sputtering 期刊论文
applied physics letters, 2005, 期号: 86
G. He; L. D. Zhang; G. H. Li; M. Liu; L. Q. Zhu; S. S. Pan
收藏 | 浏览/下载：31/0 | 提交时间：2010/08/30 |
