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科研机构
半导体研究所 [25]
内容类型
期刊论文 [21]
会议论文 [4]
发表日期
2008 [2]
2003 [3]
2002 [1]
2001 [1]
2000 [9]
1999 [2]
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半导体材料 [25]
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Effect of indium-doped interlayer on the strain relief in GaN films grown on Si(111)
期刊论文
physica status solidi a-applications and materials science, 2008, 卷号: 205, 期号: 2, 页码: 294-299
Wu, JJ
;
Zhao, LB
;
Zhang, GY
;
Liu, XL
;
Zhu, QS
;
Wang, ZG
;
Jia, QJ
;
Guo, LP
;
Hu, TD
收藏
  |  
浏览/下载:66/3
  |  
提交时间:2010/03/08
CHEMICAL-VAPOR-DEPOSITION
TEMPERATURE ALN INTERLAYERS
PHASE EPITAXY
OPTICAL-PROPERTIES
SURFACTANT
SUBSTRATE
STRESS
SI
REDUCTION
SAPPHIRE
Peculiarity of constant photocurrent method for silicon films with mixed amorphous-nanocrystalline structure
期刊论文
journal of non-crystalline solids, 2008, 卷号: 354, 期号: 19-25, 页码: 2282-2285
Kazanskii, AG
;
Kong, GL
;
Zeng, XB
;
Hao, HY
;
Liu, FZ
收藏
  |  
浏览/下载:104/29
  |  
提交时间:2010/03/08
silicon
conductivity
chemical vapor deposition
microcrystallinity
absorption
photoconductivity
In0.25Ga0.75As growth on low-temperature thin buffer layers formed on GaAs (001) substrate
期刊论文
journal of crystal growth, 2003, 卷号: 247, 期号: 1-2, 页码: 126-130
作者:
Xu B
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  |  
浏览/下载:56/0
  |  
提交时间:2010/08/12
dislocation
interfaces
strain
molecular beam epitaxy
semiconductor IIIV materials
MOLECULAR-BEAM EPITAXY
SURFACE-MORPHOLOGY
TECHNOLOGY
GAAS(001)
BEHAVIOR
SI
Influence of high-temperature AIN buffer thickness on the properties of GaN grown on Si(111)
期刊论文
journal of crystal growth, 2003, 卷号: 258, 期号: 1-2, 页码: 34-40
作者:
Zhao DG
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  |  
浏览/下载:299/12
  |  
提交时间:2010/08/12
metalorganic chemical vapor deposition
nitrides
semiconductor III-V materials
MOLECULAR-BEAM EPITAXY
HIGH-QUALITY GAN
CHEMICAL-VAPOR-DEPOSITION
INTERMEDIATE LAYER
ALAS
ALN
SURFACES
SILICON
FILMS
The growth morphologies of GaN layer on Si(111) substrate
期刊论文
journal of crystal growth, 2003, 卷号: 247, 期号: 1-2, 页码: 91-98
Lu YA
;
Liu XL
;
Lu DC
;
Yuan HR
;
Hu GQ
;
Wang XH
;
Wang ZG
;
Duan XF
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  |  
浏览/下载:21/0
  |  
提交时间:2010/08/12
Si(111) substrate
heteroepitaxy
metalorganic chemical vapor deposition
GaN
LIGHT-EMITTING-DIODES
CHEMICAL-VAPOR-DEPOSITION
NUCLEATION LAYERS
BUFFER LAYER
SILICON
SAPPHIRE
NITRIDE
EPITAXY
STRESS
STRAIN
Very low-pressure VLP-CVD growth of high quality gamma-Al2O3 films on silicon by multi-step process
期刊论文
journal of crystal growth, 2002, 卷号: 236, 期号: 1-3, 页码: 261-266
Tan LW
;
Zan YD
;
Wang J
;
Wang QY
;
Yu YH
;
Wang SR
;
Liu ZL
;
Lin LY
收藏
  |  
浏览/下载:81/3
  |  
提交时间:2010/08/12
metalorganic chemical vapor deposition
CHEMICAL-VAPOR-DEPOSITION
EPITAXIAL-GROWTH
AL2O3 FILMS
SI
Comprehensive analysis of microtwins in the 3C-SiC films on Si(001) substrates
期刊论文
journal of crystal growth, 2001, 卷号: 233, 期号: 1-2, 页码: 40-44
Zheng XH
;
Qu B
;
Wang YT
;
Dai ZZ
;
Han JY
;
Yang H
;
Liang JW
收藏
  |  
浏览/下载:98/10
  |  
提交时间:2010/08/12
X-ray diffraction
chemical vapor deposition processes
silicon carbide
CHEMICAL-VAPOR-DEPOSITION
GROWTH
GAN
SI
DEFECTS
EPITAXY
LAYERS
MBE
The content calculation of hexagonal phase inclusions in cubic GaN films on GaAs(001) substrates grown by metalorganic chemical vapor deposition
期刊论文
thin solid films, 2000, 卷号: 368, 期号: 2, 页码: 237-240
Sun XL
;
Wang YY
;
Yang H
;
Li JB
;
Zheng LX
;
Xu DP
;
Wang ZG
收藏
  |  
浏览/下载:47/0
  |  
提交时间:2010/08/12
metalorganic chemical vapor deposition
cubic GaN
hexagonal phase content
4-circle X-ray double crystal diffraction
MOLECULAR-BEAM EPITAXY
GALLIUM NITRIDE
THIN-FILMS
SILICON
GAAS
Doping during low-temperature growth of materials for n-p-n Si/SiGe/Si heterojuction bipolar transistor by gas source molecular beam epitaxy
期刊论文
journal of crystal growth, 2000, 卷号: 208, 期号: 1-4, 页码: 322-326
Liu JP
;
Huang DD
;
Li JP
;
Lin YX
;
Sun DZ
;
Kong MY
收藏
  |  
浏览/下载:70/14
  |  
提交时间:2010/08/12
n-type doping
p-type doping
Si/SiGe
HBT
GSMBE
SI
Photoluminescence and optical quenching of photoconductivity studies on undoped GaN grown by molecular beam epitaxy
期刊论文
journal of crystal growth, 2000, 卷号: 217, 期号: 3, 页码: 228-232
Xu HZ
;
Wang ZG
;
Harrison I
;
Bell A
;
Ansell BJ
;
Winser AJ
;
Cheng TS
;
Foxon CT
;
Kawabe M
收藏
  |  
浏览/下载:45/0
  |  
提交时间:2010/08/12
GaN
photoluminescence
optical quenching of photoconductivity
native defect level
molecular beam epitaxy
N-TYPE GAN
DEEP-LEVEL DEFECTS
YELLOW LUMINESCENCE
MAGNETIC-RESONANCE
THIN-FILMS
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