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Electrical transport properties of the Si-doped cubic boron nitride thin films prepared by in situ cosputtering 期刊论文
journal of applied physics, 2011, 卷号: 109, 期号: 2, 页码: article no.23716
作者:  Yin ZG;  Zhang XW;  Tan HR;  Fan YM;  Zhang SG
收藏  |  浏览/下载:43/3  |  提交时间:2011/07/05
Origin of flat-band voltage sharp roll-off in metal gate/high-k/ultrathin- SiO2/Si p-channel metal-oxide-semiconductor stacks 期刊论文
applied physics letters, 2010, 卷号: 97, 期号: 13, 页码: art. no. 132908
Zheng XH (Zheng X. H.); Huang AP (Huang A. P.); Xiao ZS (Xiao Z. S.); Yang ZC (Yang Z. C.); Wang M (Wang M.); Zhang XW (Zhang X. W.); Wang WW (Wang W. W.); Chu PK (Chu Paul K.)
收藏  |  浏览/下载:11/0  |  提交时间:2010/11/14
OXYGEN  GATE  DIFFUSION  FILMS  
The growth of an AlGaN/GaN modulation-doped heterostructure by NH3 source molecular beam epitaxy 期刊论文
journal of crystal growth, 1998, 卷号: 192, 期号: 1-2, 页码: 93-96
Zhang JP; Sun DZ; Li XB; Wang XL; Fu RH; Kong MY
收藏  |  浏览/下载:29/0  |  提交时间:2010/08/12
Kinetics and transport model for the chemical vapor epitaxy of GexSi1-x 期刊论文
journal of crystal growth, 1997, 卷号: 172, 期号: 0, 页码: 381-388
Jin XJ; Liang JW
收藏  |  浏览/下载:10/0  |  提交时间:2010/11/17
The dependence of GexSi1-x epitaxial growth on GeH4 flow using chemical vapour deposition 期刊论文
journal of materials science-materials in electronics, 1997, 卷号: 8, 期号: 6, 页码: 405-408
Jin XJ; Liang JW
收藏  |  浏览/下载:20/0  |  提交时间:2010/08/12


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