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科研机构
半导体研究所 [39]
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期刊论文 [35]
会议论文 [4]
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2011 [2]
2009 [1]
2008 [2]
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半导体材料 [39]
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学科主题:半导体材料
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Effect of high temperature AlGaN buffer thickness on GaN Epilayer grown on Si(111) substrates
期刊论文
journal of materials science-materials in electronics, 2011, 卷号: 22, 期号: 8, 页码: 1028-1032
作者:
Pan X
收藏
  |  
浏览/下载:22/0
  |  
提交时间:2011/09/14
CHEMICAL-VAPOR-DEPOSITION
PHASE EPITAXY
ALN INTERLAYERS
FILMS
STRESS
LAYERS
DISLOCATIONS
REDUCTION
DENSITY
DIODES
Growth of GaN film on Si (111) substrate using AlN sandwich structure as buffer
期刊论文
journal of crystal growth, 2011, 卷号: 318, 期号: 1, 页码: 464-467
作者:
Pan X
收藏
  |  
浏览/下载:82/5
  |  
提交时间:2011/07/05
Sandwich structure
Stress
Aluminum nitride
Gallium nitride
Silicon
PHONON DEFORMATION POTENTIALS
WURTZITE ALN
SILICON
STRESS
TRANSISTORS
EPITAXY
LAYERS
The structural, morphological and magnetic characteristics of Mn-implanted nonpolar a-plane GaN films
期刊论文
physica status solidi a-applications and materials science, 2009, 卷号: 206, 期号: 1, 页码: 91-93
Sun LL
;
Yan FW
;
Wang JX
;
Zeng YP
;
Wang GH
;
Li JM
收藏
  |  
浏览/下载:220/46
  |  
提交时间:2010/03/08
ROOM-TEMPERATURE
THIN-FILMS
(GA
MN)N
Effect of indium-doped interlayer on the strain relief in GaN films grown on Si(111)
期刊论文
physica status solidi a-applications and materials science, 2008, 卷号: 205, 期号: 2, 页码: 294-299
Wu, JJ
;
Zhao, LB
;
Zhang, GY
;
Liu, XL
;
Zhu, QS
;
Wang, ZG
;
Jia, QJ
;
Guo, LP
;
Hu, TD
收藏
  |  
浏览/下载:72/3
  |  
提交时间:2010/03/08
CHEMICAL-VAPOR-DEPOSITION
TEMPERATURE ALN INTERLAYERS
PHASE EPITAXY
OPTICAL-PROPERTIES
SURFACTANT
SUBSTRATE
STRESS
SI
REDUCTION
SAPPHIRE
Temperature dependence of surface quantum dots grown under frequent growth interruption
期刊论文
physica e-low-dimensional systems & nanostructures, 2008, 卷号: 40, 期号: 3, 页码: 503-506
Yu, LK
;
Xu, B
;
Wang, ZG
;
Jin, P
;
Zhao, C
;
Lei, W
;
Sun, J
;
Hu, LJ
收藏
  |  
浏览/下载:26/1
  |  
提交时间:2010/03/08
growth interruption
in segregation
photoluminescence
molecular beam epitaxy
quantum dots
Study on surface morphology of GaN growth by MOCVD on GaN/Si(111) template
会议论文
3rd asian conference on crystal growth and crystal technology (cgct-3), beijing, peoples r china, oct 16-19, 2005
Liu, Z
;
Wang, JX
;
Wang, XL
;
Hu, GX
;
Guo, LC
;
Liu, HX
;
Li, JP
;
Li, JM
;
Zeng, YP
收藏
  |  
浏览/下载:224/40
  |  
提交时间:2010/03/29
surface morphology
Electrical properties of undoped In0.53Ga0.47As grown on InP substrates by molecular beam epitaxy
期刊论文
journal of crystal growth, 2006, 卷号: 293, 期号: 2, 页码: 291-293
Cui LJ (Cui L. J.)
;
Zeng YP (Zeng Y. P.)
;
Wang BQ (Wang B. Q.)
;
Zhu ZP (Zhu Z. P.)
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  |  
浏览/下载:22/0
  |  
提交时间:2010/04/11
characterization
point defects
molecular beam epitaxy
semiconducting gallium compounds
semiconducting indium compounds
semiconducting ternary compounds
1.55 MU-M
QUANTUM-WELLS
TEMPERATURE
GAAS
Electrical properties of B-doped polycrystalline silicon thin films prepared by rapid thermal chemical vapour deposition
期刊论文
thin solid films, 2006, 卷号: 497, 期号: 1-2, 页码: 157-162
Ai B
;
Shen H
;
Liang ZC
;
Chen Z
;
Kong GL
;
Liao XB
收藏
  |  
浏览/下载:49/0
  |  
提交时间:2010/04/11
chemical vapour deposition
electrical properties and measurements
scanning electron microscopy
polycrystalline silicon
GRAIN-BOUNDARIES
STATES
Crack control in GaN grown on silicon (111) using In doped low-temperature AlGaN interlayer by metalorganic chemical vapor deposition
期刊论文
optical materials, 2006, 卷号: 28, 期号: 10, 页码: 1227-1231
Wu JJ (Wu Jiejun)
;
Han XX (Han Xiuxun)
;
Li JM (Li Jiemin)
;
Wei HY (Wei Hongyuan)
;
Cong GW (Cong Guangwei)
;
Liu XL (Liu Xianglin)
;
Zhu QS (Zhu Qinsheng)
;
Wang ZG (Wang Zhanguo)
;
Jia QJ (Jia Quanjie)
;
Guo LP (Guo Liping)
;
Hu TD (Hu Tiandou)
;
Wang HH (Wang Huanhua)
收藏
  |  
浏览/下载:51/0
  |  
提交时间:2010/04/11
in doping
cracks
Si(111) substrate
LT-AlGaN interlayer
metalorganic chemical vapor deposition
GaN
PHASE EPITAXY
INDIUM-SURFACTANT
OPTICAL-PROPERTIES
SI(111)
STRESS
FILMS
The effect of AlN growth time on the electrical properties of Al0.38Ga0.62N/AlN/GaN HEMT structures
期刊论文
journal of crystal growth, 2006, 卷号: 289, 期号: 2, 页码: 415-418
Wang CM
;
Wang XL
;
Hu GX
;
Wang JX
;
Xiao HL
;
Li JP
收藏
  |  
浏览/下载:44/0
  |  
提交时间:2010/04/11
2DEG
MOCVD
semiconducting III-V materials
HEMT
power devices
HETEROSTRUCTURES
PASSIVATION
SAPPHIRE
ALGAN
FIELD
GAS
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