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Effect of Ti Incorporation on the Microstructure and Properties of the a-C:H Films Deposited by Magnetron Sputtering Technique 期刊论文
Rare Metal Materials and Engineering, 2012, 卷号: 41, 期号: 增刊:1, 页码: 366-370
作者:  Wang YX(王永霞);  Ye YP(冶银平);  Li HX(李红轩);  Ji L(吉利);  Wang YJ(王永军)
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