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Depth distribution of the strain in the gan layer with low-temperature aln interlayer on si(111) substrate studied by rutherford backscattering/channeling 期刊论文
Applied physics letters, 2004, 卷号: 85, 期号: 23, 页码: 5562-5564
作者:  Lu, Y;  Cong, GW;  Liu, XL;  Lu, DC;  Wang, ZG
收藏  |  浏览/下载:13/0  |  提交时间:2019/05/12
Depth distribution of the strain in the GaN layer with low-temperature AlN interlayer on Si(111) substrate studied by Rutherford backscattering/channeling 期刊论文
applied physics letters, 2004, 卷号: 85, 期号: 23, 页码: 5562-5564
Lu, Y; Cong, GW; Liu, XL; Lu, DC; Wang, ZG; Wu, MF
收藏  |  浏览/下载:21/0  |  提交时间:2010/03/17
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