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Strain-induced morphological evolution and preferential interdiffusion in SiGe epitaxial film on Si(100) during high-temperature annealing 会议论文
10th international conference on molecular beam epitaxy (mbe-x), cannes, france, aug 31-sep 04, 1998
Liu JP; Kong MY; Liu XF; Li JP; Huang DD; Li LX; Sun DZ
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