Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography

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	Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography
	Liang, Gaofeng 1,2; Wang, Changtao 1; Zhao, Zeyu 1; Wang, Yanqin 1; Yao, Na 1; Gao, Ping 1; Luo, Yunfei 1; Gao, Guohan 1; Zhao, Qing 2; Luo, Xiangang 1
刊名	ADVANCED OPTICAL MATERIALS
	2015-09-01
卷号	3 期号:9 页码:1248-1256
ISSN号	2195-1071
英文摘要	Hyperbolic metamaterial composed of SiO2/Al films are explored to squeeze out bulk plasmon polaritons (BPPs) to produce large area and uniform deep subwavelength interference patterns. As examples, two and four BPPs interference lithography with half pitch 45 nm (approximate to lambda/8) are demonstrated in experiments. Much deeper resolution up to 22.5 nm (approximate to lambda/16) and variety of BPPs interference patterns are feasible. The period of grating structures for transferring photons to BPPs is much larger than that of BPPs interference patterns, facilitating the structures fabrication by simple and low cost methods like large area laser interference lithography. It is believed that the method provides a cost-effective, parallel, and large area nanofabrication way.
WOS标题词	Science & Technology ; Technology ; Physical Sciences
类目[WOS]	Materials Science, Multidisciplinary ; Optics
研究领域[WOS]	Materials Science ; Optics
关键词[WOS]	HOLOGRAPHIC LITHOGRAPHY ; PHOTONIC CRYSTALS ; SURFACE-PLASMONS ; NANOLITHOGRAPHY ; PHOTOLITHOGRAPHY ; TRANSMISSION ; DIFFRACTION ; FABRICATION ; ULTRAVIOLET ; REFLECTION
收录类别	SCI
语种	英语
WOS记录号	WOS:000362524300014
公开日期	2015-12-24
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/3717]
专题	光电技术研究所_光电技术研究所被WoS收录文章
作者单位	1.Chinese Acad Sci, State Key Lab Opt Technol Nanofabricat & Microeng, Inst Opt & Elect, Chengdu 610209, Peoples R China 2.Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Peoples R China
推荐引用方式 GB/T 7714	Liang, Gaofeng,Wang, Changtao,Zhao, Zeyu,et al. Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography[J]. ADVANCED OPTICAL MATERIALS,2015,3(9):1248-1256.
APA	Liang, Gaofeng.,Wang, Changtao.,Zhao, Zeyu.,Wang, Yanqin.,Yao, Na.,...&Luo, Xiangang.(2015).Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography.ADVANCED OPTICAL MATERIALS,3(9),1248-1256.
MLA	Liang, Gaofeng,et al."Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography".ADVANCED OPTICAL MATERIALS 3.9(2015):1248-1256.