Analysis of fabricating arbitrary nanoscale patterns by LSPP direct writing lithography with two-dimensional metal hole-array

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	Analysis of fabricating arbitrary nanoscale patterns by LSPP direct writing lithography with two-dimensional metal hole-array
	Shi, Sha 1; Zhang, Zhiyou 1; Shi, Ruiying 1; Niu, Xiaoyun 1; Li, Shuhong 1; Li, Min 1; Wang, Jingquan 1; Du, Jinglei 1; Gao, Fuhua 1; Du, Chunlei 2
刊名	MICROELECTRONIC ENGINEERING
	2011-08-01
卷号	88 期号:8 页码:1931-1934
关键词	TMH Local surface plasmon polariton Parallel direct writing lithography
英文摘要	We propose to use two-dimensional metal hole-array (TMH) and spatial light modulator (SLM) technology to construct a parallel direct-writing system. SLM and movable platform are used to control the system for realizing multi-beam parallel scanning exposure to fabricate arbitrary patterns. In this system TMH is the key component which focuses the incident light beams into light spots in the photoresist by exciting local surface plasmon polariton (LSPP). Parameters of TMH are optimized to improve the focusing efficiency and transmission depth of the light spots. Theoretical analysis and numerical simulations show that the feature size and transmission depth can reach sub-80 nm and 90 nm, respectively, by an optimized TMH, which is feasible for parallel direct writing lithography. (C) 2011 Elsevier B.V. All rights reserved.
WOS标题词	Science & Technology ; Technology ; Physical Sciences
类目[WOS]	Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied
研究领域[WOS]	Engineering ; Science & Technology - Other Topics ; Optics ; Physics
关键词[WOS]	TRANSMISSION ; GRATINGS
收录类别	SCI
语种	英语
WOS记录号	WOS:000293663400072
公开日期	2015-12-24
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/3427]
专题	光电技术研究所_光电技术研究所被WoS收录文章
作者单位	1.Sichuan Univ, Sch Phys, Chengdu 610064, Peoples R China 2.CAS, Inst Opt & Elect, Chengdu 610209, Peoples R China
推荐引用方式 GB/T 7714	Shi, Sha,Zhang, Zhiyou,Shi, Ruiying,et al. Analysis of fabricating arbitrary nanoscale patterns by LSPP direct writing lithography with two-dimensional metal hole-array[J]. MICROELECTRONIC ENGINEERING,2011,88(8):1931-1934.
APA	Shi, Sha.,Zhang, Zhiyou.,Shi, Ruiying.,Niu, Xiaoyun.,Li, Shuhong.,...&Du, Chunlei.(2011).Analysis of fabricating arbitrary nanoscale patterns by LSPP direct writing lithography with two-dimensional metal hole-array.MICROELECTRONIC ENGINEERING,88(8),1931-1934.
MLA	Shi, Sha,et al."Analysis of fabricating arbitrary nanoscale patterns by LSPP direct writing lithography with two-dimensional metal hole-array".MICROELECTRONIC ENGINEERING 88.8(2011):1931-1934.