Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography

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	Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography
	Di, Chengliang 1,2; Hu, Song 1; Yan, Wei 1; Li, Yanli 1; Li, Guang 1,2; Tong, Junmin 3
刊名	IEEE PHOTONICS JOURNAL
	2014-06-01
卷号	6 期号:3
关键词	Interferometry metrology fringe analysis phase unwrapping lithography
英文摘要	Focusing of wafer plane is an essential factor to determine the ultimate feature size of the stepper such as projection lithographic system. Based on Michelson interferometeric system, this paper demonstrates an interferometric focusing scheme for projection lithography to coaxially locate the ideal focal plane of the projective objective. The collimated incident laser beam is divided into the reference arm and object arm. The latter propagates through the objective lens and then interferes with the slightly deflected reference beam that reflected back by a fixed mirror, giving rise to an interferential pattern on the CCD. Any amounts of defocusing can be directly indicated from the demodulated phase of the interferential pattern. In this manner, the focusing sensitivity at nanometer scale is experimentally attainable, which shows great superiority over traditional methods, particularly the limited focal length of current projective objective lens.
WOS标题词	Science & Technology ; Technology ; Physical Sciences
类目[WOS]	Engineering, Electrical & Electronic ; Optics ; Physics, Applied
研究领域[WOS]	Engineering ; Optics ; Physics
关键词[WOS]	ALIGNMENT ; STEPPERS
收录类别	SCI
语种	英语
WOS记录号	WOS:000340830400010
公开日期	2015-12-24
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/2482]
专题	光电技术研究所_光电技术研究所被WoS收录文章
作者单位	1.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 3.Xuchang Vocat & Tech Coll, Xuchang 461000, Peoples R China
推荐引用方式 GB/T 7714	Di, Chengliang,Hu, Song,Yan, Wei,et al. Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography[J]. IEEE PHOTONICS JOURNAL,2014,6(3).
APA	Di, Chengliang,Hu, Song,Yan, Wei,Li, Yanli,Li, Guang,&Tong, Junmin.(2014).Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography.IEEE PHOTONICS JOURNAL,6(3).
MLA	Di, Chengliang,et al."Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography".IEEE PHOTONICS JOURNAL 6.3(2014).