Single closed fringe pattern phase demodulation in alignment of nanolithography

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	Single closed fringe pattern phase demodulation in alignment of nanolithography
	Xu, Feng 1,2; Hu, Song 1; Yang, Yong 1; Li, Jinlong 1,2; Li, Lanlan 1,2
刊名	OPTIK
	2013
卷号	124 期号:9 页码:818-823
关键词	Alignment Closed fringe Phase demodulation 2-D wavelet ridge
英文摘要	The single closed fringe pattern that occurs in two superposed grating marks applied in the previously designed moire alignment scheme based on dual-grating for lithography is processed and analyzed using a frequency domain method based on two-dimensional (2-D) analytic wavelet transform (AWT) and 2-D wavelet ridge algorithm. The sign ambiguities, which always occur in the process of single closed fringe pattern analysis, are removed through the discontinuities of the angle in the 2-D wavelet ridge. Theoretical analysis regarding application of 2-D AWT and 2-D wavelet ridge to the interference fringe in alignment is performed. Verification of this process is carried out through numerical simulation and experiment. Results indicate that the background and noise in the fringes can be filtered effectively through our method, and the phase information can be obtained successfully. (C) 2012 Elsevier GmbH. All rights reserved.
WOS标题词	Science & Technology ; Physical Sciences
类目[WOS]	Optics
研究领域[WOS]	Optics
关键词[WOS]	WINDOWED FOURIER-TRANSFORM ; X-RAY-LITHOGRAPHY ; MOIRE FRINGE ; INTERFEROMETRY ; SYSTEM ; EXTRACTION ; ALGORITHM
收录类别	SCI
语种	英语
WOS记录号	WOS:000318056600010
公开日期	2015-12-24
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/1237]
专题	光电技术研究所_光电技术研究所被WoS收录文章
作者单位	1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China
推荐引用方式 GB/T 7714	Xu, Feng,Hu, Song,Yang, Yong,et al. Single closed fringe pattern phase demodulation in alignment of nanolithography[J]. OPTIK,2013,124(9):818-823.
APA	Xu, Feng,Hu, Song,Yang, Yong,Li, Jinlong,&Li, Lanlan.(2013).Single closed fringe pattern phase demodulation in alignment of nanolithography.OPTIK,124(9),818-823.
MLA	Xu, Feng,et al."Single closed fringe pattern phase demodulation in alignment of nanolithography".OPTIK 124.9(2013):818-823.