A comparative study of CCl4 reactions on Ag and Si surfaces by in situ ultraviolet photoemission electron microscopy
Yao, Yunxi; Fu, Qiang; Tan, Dali; Bao, Xinhe
刊名journal of physics-condensed matter
2009-08-05
卷号21期号:31
英文摘要the reactivity of a bulk ag surface, an ag monolayer film on si(111)-7 x 7 (denoted as the root 3 x root 3-ag-si surface), and si(111)-7 x 7 to ccl4 was investigated by x-ray photoelectron spectroscopy (xps) and ultraviolet photoemission electron microscopy (uv-peem). in situ uv-peem was used to monitor simultaneously the ccl4 dissociation on different surface domains, including the bulk ag, root 3 x root 3-ag-si, and si(111). the peem results combined with xps data show that ccl4 adsorbs dissociatively on bulk ag(111) and si(111) but adsorbs molecularly on the root 3 x root 3-ag-si surface, and the surface reactivity follows the order of si(111) > ag(111) > root 3 x root 3-ag-si.
WOS标题词science & technology ; physical sciences
类目[WOS]physics, condensed matter
研究领域[WOS]physics
关键词[WOS]adsorption ; turbulence ; oxidation ; emission ; dynamics ; ag(111) ; metals ; growth
收录类别SCI ; ISTP
语种英语
WOS记录号WOS:000267880300015
公开日期2015-11-17
内容类型期刊论文
源URL[http://159.226.238.44/handle/321008/141505]  
专题大连化学物理研究所_中国科学院大连化学物理研究所
作者单位Chinese Acad Sci, State Key Lab Catalysis, Dalian Inst Chem Phys, Dalian 116023, Peoples R China
推荐引用方式
GB/T 7714
Yao, Yunxi,Fu, Qiang,Tan, Dali,et al. A comparative study of CCl4 reactions on Ag and Si surfaces by in situ ultraviolet photoemission electron microscopy[J]. journal of physics-condensed matter,2009,21(31).
APA Yao, Yunxi,Fu, Qiang,Tan, Dali,&Bao, Xinhe.(2009).A comparative study of CCl4 reactions on Ag and Si surfaces by in situ ultraviolet photoemission electron microscopy.journal of physics-condensed matter,21(31).
MLA Yao, Yunxi,et al."A comparative study of CCl4 reactions on Ag and Si surfaces by in situ ultraviolet photoemission electron microscopy".journal of physics-condensed matter 21.31(2009).
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