Modulation of surface reactivity via electron confinement in metal quantum well films: O(2) adsorption on Pb/Si(111)

	Modulation of surface reactivity via electron confinement in metal quantum well films: O(2) adsorption on Pb/Si(111)
	Zhang, Zhen 1; Zhang, Yanfeng 2; Fu, Qiang 1; Zhang, Hui 1; Yao, Yunxi 1; Ma, Teng 1; Tan, Dali 1; Xue, Qikun 2; Bao, Xinhe 1
刊名	journal of chemical physics
	2008-07-07
卷号	129 期号:1
英文摘要	pb quantum well films with atomic-scale uniformity in thickness over macroscopic areas were prepared on si(111)-7x7 surfaces. as a probe molecule, o(2) was used to explore the effect of electron confinement in the metal films on the surface reactivity. x-ray photoelectron spectroscopy results showed clear oscillations of oxygen adsorption and pb oxidation with the thickness of the pb films. the higher reactivity to o(2) on the films with 23 and 25 ml pb has been attributed to their highest occupied quantum well states being close to the fermi level (e(f)) and the high density of the electron states at e(f) (dos-e(f)), as evidenced by the corresponding ultraviolet photoelectron spectroscopy. a dominant role of dos-e(f) was suggested to explain the quantum modulation of surface reactivity in metal quantum well films. (c) 2008 american institute of physics.
WOS标题词	science & technology ; physical sciences
类目[WOS]	physics, atomic, molecular & chemical
研究领域[WOS]	physics
关键词[WOS]	level local-density ; carbon-monoxide ; sticking coefficient ; platinum catalysts ; initial sticking ; work function ; oxidation ; chemisorption ; oxygen ; states
收录类别	SCI
语种	英语
WOS记录号	WOS:000257468100035
公开日期	2015-11-17
内容类型	期刊论文
源URL	[http://159.226.238.44/handle/321008/141099]
专题	大连化学物理研究所_中国科学院大连化学物理研究所
作者单位	1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China 2.Tsinghua Univ, Dept Phys, Beijing 100084, Peoples R China
推荐引用方式 GB/T 7714	Zhang, Zhen,Zhang, Yanfeng,Fu, Qiang,et al. Modulation of surface reactivity via electron confinement in metal quantum well films: O(2) adsorption on Pb/Si(111)[J]. journal of chemical physics,2008,129(1).
APA	Zhang, Zhen.,Zhang, Yanfeng.,Fu, Qiang.,Zhang, Hui.,Yao, Yunxi.,...&Bao, Xinhe.(2008).Modulation of surface reactivity via electron confinement in metal quantum well films: O(2) adsorption on Pb/Si(111).journal of chemical physics,129(1).
MLA	Zhang, Zhen,et al."Modulation of surface reactivity via electron confinement in metal quantum well films: O(2) adsorption on Pb/Si(111)".journal of chemical physics 129.1(2008).