Photoemission study of CCl(4) adsorption on Si(111)-7x7

	Photoemission study of CCl(4) adsorption on Si(111)-7x7
	Yao, Yunxi; Fu, Qiang; Tan, Dali; Bao, Xinhe
刊名	surface science
	2008-07-01
卷号	602 期号:13 页码:2183-2188
关键词	X-ray photoelectron spectroscopy ultraviolet photoelectron spectroscopy chemisorption silicon solid-gas interfaces carbon tetrachloride
英文摘要	adsorption of carbon tetrachloride (ccl(4)) on si(111)-7 x 7 at room temperature (rt) and low temperature (lt) was investigated by x-ray photoelectron spectroscopy (xps) and ultraviolet photoelectron spectroscopy (ups). it was demonstrated that at rt ccl(4) dissociates on the si(111)-7 x 7 surface leaving the surface extensively adsorbed with atomic cl species. the dissociated cl shows site preference to si restatoms resulting in quick extinction of dangling bonds at the si restatoms. at lt (around 120 k), both molecular and dissociative adsorption of ccl(4) occurs, which produces cl, ccl(x) (x <= 3), and ccl(4) on the surface. the dangling bonds at the restatoms and adatoms were simultaneously quenched upon the lt ccl(4) adsorption. the site selectivity of restatoms to adatoms for molecule adsorption on the si(l 11)-7 x 7 surface is discussed. (c) 2008 elsevier b.v. all rights reserved.
WOS标题词	science & technology ; physical sciences
类目[WOS]	chemistry, physical ; physics, condensed matter
研究领域[WOS]	chemistry ; physics
关键词[WOS]	scanning-tunneling-microscopy ; synchrotron-radiation ; surface-chemistry ; oxygen-adsorption ; site selectivity ; cl adsorption ; dissociation ; desorption ; hydrogen ; chemisorption
收录类别	SCI
语种	英语
WOS记录号	WOS:000257837500011
公开日期	2015-11-17
内容类型	期刊论文
源URL	[http://159.226.238.44/handle/321008/141046]
专题	大连化学物理研究所_中国科学院大连化学物理研究所
作者单位	Chinese Acad Sci, State Key Lab Catalysis, Dalian Inst Chem Phys, Dalian 116023, Peoples R China
推荐引用方式 GB/T 7714	Yao, Yunxi,Fu, Qiang,Tan, Dali,et al. Photoemission study of CCl(4) adsorption on Si(111)-7x7[J]. surface science,2008,602(13):2183-2188.
APA	Yao, Yunxi,Fu, Qiang,Tan, Dali,&Bao, Xinhe.(2008).Photoemission study of CCl(4) adsorption on Si(111)-7x7.surface science,602(13),2183-2188.
MLA	Yao, Yunxi,et al."Photoemission study of CCl(4) adsorption on Si(111)-7x7".surface science 602.13(2008):2183-2188.