飞秒激光作用下全向高反膜破坏的激发过程

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 强场激光物理国家重点实验室

	飞秒激光作用下全向高反膜破坏的激发过程; Ultrafast electronic dynamics during femtosecond laser-induced damage in omnidirectional reflector
	孙海轶 ; 贾天卿 ; 李晓溪 ; 徐世珍 ; 冯东海 ; 李成斌 ; 王晓峰 ; 徐至展
刊名	物理学报
	2005
卷号	54 期号:10 页码:4736
关键词	飞秒激光 ferntosecond laser 全向高反膜 onmidirectional reflector 激发过程 excitation processes 破坏机制 damage mechanisms 激光作用高反膜耦合动力学模型材料破坏脉冲能量抽运光
ISSN号	1000-3290
其他题名	Ultrafast electronic dynamics during femtosecond laser-induced damage in omnidirectional reflector
中文摘要	设计和制备了全向高反膜SiO2／TiO2，研究了它在不同脉冲宽度、不同脉冲能量的飞秒激光作用下的破坏阈值和烧蚀深度．利用发展的抽运．探针方法，研究了抽运脉冲作用下材料中导带电子的超快激发和能量沉积过程，建立并求解了飞秒激光激发材料和材料的激发对抽运光自身反作用的耦合动力学模型．模型较好地揭示了材料破坏的激发过程．; The onmidirectional reflector SiO2/TiO2 is prepared and its threshold fluences and ablation depths at different pulse durations and fluences is studied. In addition a new pump and probe experiment system is developed. The probe pulse is kept as short as possible, while, the pump pulse is stretched and its duration is much longer than that of the probe pulse. Time-resolved excitation processes and damage mechanisms in onmidirectional reflector SiO2/TiO2 is studied. A coupled dynamic model, not only considering the excitation of the material by the laser, but also the counteraction of this excitation to the laser, is employed to study the damage mechanisms. This model well explains the excitation processes during the damage of omnidirectional reflector.
学科主题	激光技术;激光物理与基本理论
分类号	TN873.3;TN24
收录类别	ei
语种	中文
公开日期	2009-09-18 ; 2010-10-12
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/334]
专题	上海光学精密机械研究所_强场激光物理国家重点实验室
推荐引用方式 GB/T 7714	孙海轶,贾天卿,李晓溪,等. 飞秒激光作用下全向高反膜破坏的激发过程, Ultrafast electronic dynamics during femtosecond laser-induced damage in omnidirectional reflector[J]. 物理学报,2005,54(10):4736, 4740.
APA	孙海轶.,贾天卿.,李晓溪.,徐世珍.,冯东海.,...&徐至展.(2005).飞秒激光作用下全向高反膜破坏的激发过程.物理学报,54(10),4736.
MLA	孙海轶,et al."飞秒激光作用下全向高反膜破坏的激发过程".物理学报 54.10(2005):4736.