Quantitative relationship between contact stress and magnetic signal strength in perpendicular recording media
Liu Y. L. ; Xiong S. M. ; Lou J. ; Bogy D. B. ; Zhang G. Y.
刊名Journal of Applied Physics
2014
卷号115期号:17页码:3
ISSN号ISBN/0021-8979
英文摘要A series of nanoscratch experiments is conducted using constant loading scratch profiles to apply mechanical contact stress on perpendicular magnetic recording (PMR) media to cause its magnetic signal strength decay, which is characterized by the magnetic force microscope. The dependence of the magnetic signal strength on the applied normal load is quantitatively investigated. The results indicate that an increase of the applied normal load leads to a decrease of the magnetic signal strength. In addition, in order to obtain a more complete understanding of the results, a 3D finite element model is created to calculate the stress under different normal loads. Finally, the quantitative relationship between residual shear stress and magnetic signal strength is identified. (C) 2014 AIP Publishing LLC.
收录类别SCI
语种英语
内容类型期刊论文
源URL[http://ir.ciomp.ac.cn/handle/181722/44300]  
专题长春光学精密机械与物理研究所_中科院长春光机所知识产出
推荐引用方式
GB/T 7714
Liu Y. L.,Xiong S. M.,Lou J.,et al. Quantitative relationship between contact stress and magnetic signal strength in perpendicular recording media[J]. Journal of Applied Physics,2014,115(17):3.
APA Liu Y. L.,Xiong S. M.,Lou J.,Bogy D. B.,&Zhang G. Y..(2014).Quantitative relationship between contact stress and magnetic signal strength in perpendicular recording media.Journal of Applied Physics,115(17),3.
MLA Liu Y. L.,et al."Quantitative relationship between contact stress and magnetic signal strength in perpendicular recording media".Journal of Applied Physics 115.17(2014):3.
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