Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols

CORC > 兰州化学物理研究所 > 中国科学院兰州化学物理研究所 > 先进润滑与防护材料研究发展中心

	Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols
	Hai WX(海万秀); Ceng JL(曾俊菱); Meng JH(孟军虎); Lv JJ(吕晋军)
刊名	Key Engineering Materials
	2014
卷号	602-603 页码:511-514
关键词	Ti3SiC2 Alcohols Surface finishing Surface roughness
ISSN号	1013-9826
通讯作者	孟军虎
英文摘要	The surface polishing of Ti₃SiC₂ disk in fluids (water, ethanol, propanol, glycol, and glycerol) is conducted on a Buehler grinder/polisher and evaluated using surface roughness. Using Buehler automatic grinder/polisher, the Ti₃SiC₂ disks are grinded and polished in the as-mentioned lubricants by grinding disk of diamond with sizes of 45 μm to 3 μm. The surface roughnesses of Ti₃SiC₂ disks at each stage are measured by 3D surface profiler. The results show that the lowest surface roughness (Ra) of Ti₃SiC₂ disk obtained by mechanical polishing is 0.04 μm. The optimum polishing process of Ti₃SiC₂ disk is as follows: using water as lubricant, at a load of 5 N, for steps 1 to 4, the Ti₃SiC₂ and grinding disk rotates comparatively and the sizes of diamond particles on the abrasive disk are 45, 15, 9, and 3 μm, respectively. For step 5, the abrasive disk is woven cloth with no diamond particles. The duration of each step is 5 min. Using the same polishing process, the surface roughness of Ti₃SiC₂ disk by direct hot pressing is lower than that by in situ reactive hot pressing. Using the same polishing process but different lubricants, the surface roughness of the Ti₃SiC₂ disks increases in the order of water, ethanol, propanol, glycol, and glycerol. In water, the surface roughness of Ti₃SiC₂ disk decreases with the increasing quantity of water and polishing duration.
学科主题	材料科学与物理化学
收录类别	EI
资助信息	the “Hundred Talents Program” (Junhu Meng) of Chinese Academy of Sciences;the National Natural Science Foundation of China (51075382)
语种	英语
公开日期	2014-12-24
内容类型	期刊论文
源URL	[http://210.77.64.217/handle/362003/7059]
专题	兰州化学物理研究所_先进润滑与防护材料研究发展中心兰州化学物理研究所_固体润滑国家重点实验室
推荐引用方式 GB/T 7714	Hai WX,Ceng JL,Meng JH,et al. Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols[J]. Key Engineering Materials,2014,602-603:511-514.
APA	Hai WX,Ceng JL,Meng JH,&Lv JJ.(2014).Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols.Key Engineering Materials,602-603,511-514.
MLA	Hai WX,et al."Variation of Surface Roughness of Ti3SiC2 Disk during Polishing in Water and Alcohols".Key Engineering Materials 602-603(2014):511-514.