Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C:H films deposited by mid-frequency magnetron sputtering | |
Jiang JL(姜金龙)1,2; Wang Q(王琼)1; Huang H(黄浩)1; Wang YB(王玉宝)1; Zhang X(张霞)1; Hao JY(郝俊英)2![]() | |
刊名 | Surface and Coatings Technology
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2014 | |
卷号 | 240页码:419-424 |
关键词 | a-C:H films MF magnetron sputtering Substrate rotation Microstructure and property |
ISSN号 | 0257-8972 |
通讯作者 | 姜金龙 |
英文摘要 | Ti and Si dual-doped hydrogenated amorphous carbon (a-C:H) films were synthesized by mid-frequency (MF) magnetron sputtering with stationary and rotary substrates. The effects of substrate rotation on the microstructure, surface morphology, internal stress and mechanical properties were investigated. The results show that substrate rotation plays an important role in the growth of the a-C:H films. The film deposited on rotary substrate has a higher sp2 content with high degree of bond disorder and relatively low H content, thus resulting in much lower compressive stress and high hardness. The structural changes induced by the substrate rotation are discussed in terms of subplantation and migration roles of incident species in growth of the films. Moreover, the film deposited on rotary substrate shows smoother surface with small and dense particles, which is attributed to suppressing the shadowing effect by rotating substrate. |
学科主题 | 材料科学与物理化学 |
收录类别 | SCI |
资助信息 | the Natural Science Foundation of China (51105186);the Excellent Young Teachers Program of Lanzhou University of Technology (1010ZCX010) |
语种 | 英语 |
WOS记录号 | WOS:000331989900057 |
公开日期 | 2014-12-17 |
内容类型 | 期刊论文 |
源URL | [http://210.77.64.217/handle/362003/6994] ![]() |
专题 | 兰州化学物理研究所_固体润滑国家重点实验室 |
作者单位 | 1.Lanzhou Univ Technol, Dept Phys, Lanzhou 730050, Peoples R China 2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China |
推荐引用方式 GB/T 7714 | Jiang JL,Wang Q,Huang H,et al. Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C:H films deposited by mid-frequency magnetron sputtering[J]. Surface and Coatings Technology,2014,240:419-424. |
APA | Jiang JL,Wang Q,Huang H,Wang YB,Zhang X,&Hao JY.(2014).Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C:H films deposited by mid-frequency magnetron sputtering.Surface and Coatings Technology,240,419-424. |
MLA | Jiang JL,et al."Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C:H films deposited by mid-frequency magnetron sputtering".Surface and Coatings Technology 240(2014):419-424. |
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