Electron beam evaporated LaF3 thin films prepared by different temperatures and deposition rates

	Electron beam evaporated LaF3 thin films prepared by different temperatures and deposition rates
	Guanghui Liu * ; Hongbo He ; Yunxia Jin ; Zhengxiu Fan
刊名	applied surface science
	2010
期号	256
合作状况	其它
学科主题	光学材料
收录类别	其他
语种	中文
WOS记录号	WOS:000273670700008
公开日期	2011-04-21
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/7237]
专题	上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式 GB/T 7714	Guanghui Liu *,Hongbo He,Yunxia Jin,et al. Electron beam evaporated LaF3 thin films prepared by different temperatures and deposition rates[J]. applied surface science,2010(256).
APA	Guanghui Liu *,Hongbo He,Yunxia Jin,&Zhengxiu Fan.(2010).Electron beam evaporated LaF3 thin films prepared by different temperatures and deposition rates.applied surface science(256).
MLA	Guanghui Liu *,et al."Electron beam evaporated LaF3 thin films prepared by different temperatures and deposition rates".applied surface science .256(2010).