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	Removal of silicon in acid leaching and flocculation processes during zirconium oxychloride octahydrate production
	Liu, Ran1,2,3; Xue, Tianyan1,2; Song, Jing1,2; Wang, Yu1,2; Qi, Tao1,2; Qu, Jingkui1,2; Du, Ailing3
刊名	CERAMICS INTERNATIONAL
	2014-07-01
卷号	40期号:6页码:8801-8808
关键词	Zirconium oxychloride Acid leaching Flocculation
ISSN号	0272-8842
其他题名	Ceram. Int.
中文摘要	The efficiency of silicon removal technology by acid leaching and flocculation during zirconium oxychloride octahydrate (ZrOCl2 center dot 8 H2O) production has been improved. The optimum conditions of acid leaching were found to be as follows: transiton material, 300 g; HCl (6 mol/L), 600 mL; leaching time, 4 h; and leaching temperature, 100 degrees C. The nonionic polyoxyethylene lauryl ether (AEO9) was adopted as the flocculant. The optimum flocculation conditions were found to be as follows: temperature, 40 degrees C; flocculant amount, 10 ml (concentration 1%); time, 1 h. The zirconium oxychloride solution after purification contained 36 ppm SiO2 and 160 g/L ZrOCl2. The polymerization and flocculation mechanisms of silicic acid were analyzed. Results of Fourier-transform infrared, scanning electron microscopy, nuclear magnetic resonance, and Brunauer-Emmett-Teller analyses showed the main transformation and properties of the products in the acid leaching and flocculation processes. (C) 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
英文摘要	The efficiency of silicon removal technology by acid leaching and flocculation during zirconium oxychloride octahydrate (ZrOCl2 center dot 8 H2O) production has been improved. The optimum conditions of acid leaching were found to be as follows: transiton material, 300 g; HCl (6 mol/L), 600 mL; leaching time, 4 h; and leaching temperature, 100 degrees C. The nonionic polyoxyethylene lauryl ether (AEO9) was adopted as the flocculant. The optimum flocculation conditions were found to be as follows: temperature, 40 degrees C; flocculant amount, 10 ml (concentration 1%); time, 1 h. The zirconium oxychloride solution after purification contained 36 ppm SiO2 and 160 g/L ZrOCl2. The polymerization and flocculation mechanisms of silicic acid were analyzed. Results of Fourier-transform infrared, scanning electron microscopy, nuclear magnetic resonance, and Brunauer-Emmett-Teller analyses showed the main transformation and properties of the products in the acid leaching and flocculation processes. (C) 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
WOS标题词	Science & Technology ; Technology
类目[WOS]	Materials Science, Ceramics
研究领域[WOS]	Materials Science
关键词[WOS]	REVERSE-OSMOSIS MEMBRANES ; SURFACE-CHEMISTRY ; AMORPHOUS SILICA ; FUSION ; MODEL ; NMR
收录类别	SCI
原文出处	://WOS:000335201800144
语种	英语
WOS记录号	WOS:000335201800144
公开日期	2014-08-28
内容类型	期刊论文
版本	出版稿
源URL	[http://ir.ipe.ac.cn/handle/122111/10941]
专题	过程工程研究所_研究所（批量导入）
作者单位	1.Natl Engn Lab Hydromet Cleaner Prod Technol, Beijing 100190, Peoples R China 2.Chinese Acad Sci, Inst Proc Engn, Key Lab Green Proc & Engn, Beijing 100190, Peoples R China 3.Shandong Univ, Sch Chem & Chem Engn, Jinan 250100, Shandong, Peoples R China
推荐引用方式 GB/T 7714	Liu, Ran,Xue, Tianyan,Song, Jing,et al. Removal of silicon in acid leaching and flocculation processes during zirconium oxychloride octahydrate production[J]. CERAMICS INTERNATIONAL,2014,40(6):8801-8808.
APA	Liu, Ran.,Xue, Tianyan.,Song, Jing.,Wang, Yu.,Qi, Tao.,...&Du, Ailing.(2014).Removal of silicon in acid leaching and flocculation processes during zirconium oxychloride octahydrate production.CERAMICS INTERNATIONAL,40(6),8801-8808.
MLA	Liu, Ran,et al."Removal of silicon in acid leaching and flocculation processes during zirconium oxychloride octahydrate production".CERAMICS INTERNATIONAL 40.6(2014):8801-8808.

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