Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition

	Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition
	Wu Liang-Liang, Zhao De-Gang, Li Liang, Le Ling-Cong, Chen Ping, Liu Zong-Shun, Jiang De-Sheng
刊名	acta physica sinica
	2013
卷号	62 期号:8 页码:086102
学科主题	光电子学
收录类别	EI
语种	英语
公开日期	2014-05-16
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/24979]
专题	半导体研究所_集成光电子学国家重点实验室
推荐引用方式 GB/T 7714	Wu Liang-Liang, Zhao De-Gang, Li Liang, Le Ling-Cong, Chen Ping, Liu Zong-Shun, Jiang De-Sheng. Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition[J]. acta physica sinica,2013,62(8):086102.
APA	Wu Liang-Liang, Zhao De-Gang, Li Liang, Le Ling-Cong, Chen Ping, Liu Zong-Shun, Jiang De-Sheng.(2013).Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition.acta physica sinica,62(8),086102.
MLA	Wu Liang-Liang, Zhao De-Gang, Li Liang, Le Ling-Cong, Chen Ping, Liu Zong-Shun, Jiang De-Sheng."Influence of growth conditions on the lateral grain size of AlN film grown by metal-organic chemical vapor deposition".acta physica sinica 62.8(2013):086102.