Investigation of the current collapse induced in InGaN back barrier AlGaN/GaN high electron mobility transistors | |
Xiaojia, Wan ; Xiaoliang, Wang ; Hongling, Xiao ; Chun, Feng ; Lijuan, Jiang ; Shenqi, Qu ; Zhanguo, Wang ; Xun, Hou | |
刊名 | journal of semiconductors
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2013 | |
卷号 | 34期号:10页码:104002 |
学科主题 | 半导体材料 |
收录类别 | EI |
语种 | 英语 |
公开日期 | 2014-05-16 |
内容类型 | 期刊论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/25001] ![]() |
专题 | 半导体研究所_中科院半导体材料科学重点实验室 |
推荐引用方式 GB/T 7714 | Xiaojia, Wan,Xiaoliang, Wang,Hongling, Xiao,et al. Investigation of the current collapse induced in InGaN back barrier AlGaN/GaN high electron mobility transistors[J]. journal of semiconductors,2013,34(10):104002. |
APA | Xiaojia, Wan.,Xiaoliang, Wang.,Hongling, Xiao.,Chun, Feng.,Lijuan, Jiang.,...&Xun, Hou.(2013).Investigation of the current collapse induced in InGaN back barrier AlGaN/GaN high electron mobility transistors.journal of semiconductors,34(10),104002. |
MLA | Xiaojia, Wan,et al."Investigation of the current collapse induced in InGaN back barrier AlGaN/GaN high electron mobility transistors".journal of semiconductors 34.10(2013):104002. |
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