Reduced defect density in microcrystalline silicon by hydrogen plasma treatment

	Reduced defect density in microcrystalline silicon by hydrogen plasma treatment
	Li Jingyan ; Zeng Xiangbo ; Li Hao ; Xie Xiaobing ; Yang Ping ; Xiao Haibo ; Zhang Xiaodong
刊名	journal of semiconductors
	2013
卷号	34 期号:10 页码:103006
学科主题	光电子学
收录类别	EI
语种	英语
公开日期	2014-05-08
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/24932]
专题	半导体研究所_集成光电子学国家重点实验室
推荐引用方式 GB/T 7714	Li Jingyan,Zeng Xiangbo,Li Hao,et al. Reduced defect density in microcrystalline silicon by hydrogen plasma treatment[J]. journal of semiconductors,2013,34(10):103006.
APA	Li Jingyan.,Zeng Xiangbo.,Li Hao.,Xie Xiaobing.,Yang Ping.,...&Zhang Xiaodong.(2013).Reduced defect density in microcrystalline silicon by hydrogen plasma treatment.journal of semiconductors,34(10),103006.
MLA	Li Jingyan,et al."Reduced defect density in microcrystalline silicon by hydrogen plasma treatment".journal of semiconductors 34.10(2013):103006.