A lithography-independent and fully confined fabrication process of phase-change materials in metal electrode nanogap with 16-μA threshold current and 80-mV SET voltage

CORC > 半导体研究所 > 中国科学院半导体研究所 > 半导体集成技术工程研究中心

	A lithography-independent and fully confined fabrication process of phase-change materials in metal electrode nanogap with 16-μA threshold current and 80-mV SET voltage
	Yingchun Fu, Xiaofeng Wang, Jiayong Zhang, Xiaodong Wang, Chun Chang, Huili Ma, Kaifang Cheng, Xiaogang Chen, Zhitang Song, Songlin Feng, An Ji, Fuhua Yang
刊名	Applied Physics A: Materials Science and Processing
	2013
卷号	110 期号:1 页码:173-177
学科主题	微电子学
收录类别	EI
语种	英语
公开日期	2014-05-08
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/24910]
专题	半导体研究所_半导体集成技术工程研究中心
推荐引用方式 GB/T 7714	Yingchun Fu, Xiaofeng Wang, Jiayong Zhang, Xiaodong Wang, Chun Chang, Huili Ma, Kaifang Cheng, Xiaogang Chen, Zhitang Song, Songlin Feng, An Ji, Fuhua Yang. A lithography-independent and fully confined fabrication process of phase-change materials in metal electrode nanogap with 16-μA threshold current and 80-mV SET voltage[J]. Applied Physics A: Materials Science and Processing,2013,110(1):173-177.
APA	Yingchun Fu, Xiaofeng Wang, Jiayong Zhang, Xiaodong Wang, Chun Chang, Huili Ma, Kaifang Cheng, Xiaogang Chen, Zhitang Song, Songlin Feng, An Ji, Fuhua Yang.(2013).A lithography-independent and fully confined fabrication process of phase-change materials in metal electrode nanogap with 16-μA threshold current and 80-mV SET voltage.Applied Physics A: Materials Science and Processing,110(1),173-177.
MLA	Yingchun Fu, Xiaofeng Wang, Jiayong Zhang, Xiaodong Wang, Chun Chang, Huili Ma, Kaifang Cheng, Xiaogang Chen, Zhitang Song, Songlin Feng, An Ji, Fuhua Yang."A lithography-independent and fully confined fabrication process of phase-change materials in metal electrode nanogap with 16-μA threshold current and 80-mV SET voltage".Applied Physics A: Materials Science and Processing 110.1(2013):173-177.