Synthesis and physicochemical properties of nanocrystalline silicon carbonitride films deposited by microwave plasma from organoelement compounds

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	Synthesis and physicochemical properties of nanocrystalline silicon carbonitride films deposited by microwave plasma from organoelement compounds
	Fainer, NI ; Kosinova, ML ; Rumyantsev, YM ; Maksimovskii, EA ; Kuznetsov, FA ; Kesler, VG ; Kirienko, VV ; Han, BS ; Lu, C
刊名	GLASS PHYSICS AND CHEMISTRY
	2005
卷号	31 期号:4 页码:427
关键词	THIN-FILMS NITRIDE
ISSN号	1087-6596
通讯作者	Fainer, NI (reprint author), Russian Acad Sci, Inst Inorgan Chem, Siberian Div, Pr Akademika Lavrenteva 3, Novosibirsk 630090, Russia.
中文摘要	Nanocrystalline films of a ternary compound, namely, silicon carbonitride SiCxNy, are prepared by plasma-enhanced chemical vapor deposition at temperatures of 473-1173 K with the use of a complex gaseous mixture of hexamethyldisilazane Si2NH(CH3)(6), ammonia, and helium. The chemical and phase compositions and the physicochemical properties of the films are investigated using IR, Auger electron, and X-ray photoelectron spectroscopy; ellipsometry; synchrotron X-ray powder diffraction; electron and atomic-force microscopy; microhardness measurements with a nanoindenter; and electrical measurements. Correlations of the composition of the initial gas phase and the synthesis temperature with a number of functional properties of the SiCxNy silicon carbonitride films are revealed.
收录类别	SCI
语种	英语
公开日期	2013-09-24
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/54383]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Fainer, NI,Kosinova, ML,Rumyantsev, YM,et al. Synthesis and physicochemical properties of nanocrystalline silicon carbonitride films deposited by microwave plasma from organoelement compounds[J]. GLASS PHYSICS AND CHEMISTRY,2005,31(4):427.
APA	Fainer, NI.,Kosinova, ML.,Rumyantsev, YM.,Maksimovskii, EA.,Kuznetsov, FA.,...&Lu, C.(2005).Synthesis and physicochemical properties of nanocrystalline silicon carbonitride films deposited by microwave plasma from organoelement compounds.GLASS PHYSICS AND CHEMISTRY,31(4),427.
MLA	Fainer, NI,et al."Synthesis and physicochemical properties of nanocrystalline silicon carbonitride films deposited by microwave plasma from organoelement compounds".GLASS PHYSICS AND CHEMISTRY 31.4(2005):427.