Nano-crystalline diamond films prepared by microwave argon plasma vapor deposition on optical glass | |
Yang, WB ; Kong X ; Yang, S ; Duan, XF ; Lu, FX | |
刊名 | VACUUM
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2002 | |
卷号 | 68期号:1页码:49 |
关键词 | GROWTH NUCLEATION HYDROGEN |
ISSN号 | 0042-207X |
通讯作者 | Yang, WB (reprint author), Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China. |
中文摘要 | Nano-crystalline diamond films have been prepared on glass substrate in argon and methane environments by microwave plasma chemical vapor deposition. The suitable processing parameters are methane concentration 3% in argon; total deposition pressure 13.3 kPa; substrate temperature 500degreesC heated by plasma. In this film, the grain size is < 30 nm; the roughness is about 13 nm; the boundary between grains is undefined; and there are non-crystalline structures evidently. Before deposition, the substrate must be pretreated by fine diamond powder grinding; this is to ensure that no large quadrangular grains appear and the film is continuous. The mechanical and optical performance have also been investigated. (C) 2002 Published by Elsevier Science Ltd. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-24 |
内容类型 | 期刊论文 |
源URL | [http://ir.iphy.ac.cn/handle/311004/49650] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Yang, WB,Kong X,Yang, S,et al. Nano-crystalline diamond films prepared by microwave argon plasma vapor deposition on optical glass[J]. VACUUM,2002,68(1):49. |
APA | Yang, WB,Kong X,Yang, S,Duan, XF,&Lu, FX.(2002).Nano-crystalline diamond films prepared by microwave argon plasma vapor deposition on optical glass.VACUUM,68(1),49. |
MLA | Yang, WB,et al."Nano-crystalline diamond films prepared by microwave argon plasma vapor deposition on optical glass".VACUUM 68.1(2002):49. |
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