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Nano-crystalline diamond films prepared by microwave argon plasma vapor deposition on optical glass
Yang, WB ; Kong X ; Yang, S ; Duan, XF ; Lu, FX
刊名VACUUM
2002
卷号68期号:1页码:49
关键词GROWTH NUCLEATION HYDROGEN
ISSN号0042-207X
通讯作者Yang, WB (reprint author), Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China.
中文摘要Nano-crystalline diamond films have been prepared on glass substrate in argon and methane environments by microwave plasma chemical vapor deposition. The suitable processing parameters are methane concentration 3% in argon; total deposition pressure 13.3 kPa; substrate temperature 500degreesC heated by plasma. In this film, the grain size is < 30 nm; the roughness is about 13 nm; the boundary between grains is undefined; and there are non-crystalline structures evidently. Before deposition, the substrate must be pretreated by fine diamond powder grinding; this is to ensure that no large quadrangular grains appear and the film is continuous. The mechanical and optical performance have also been investigated. (C) 2002 Published by Elsevier Science Ltd.
收录类别SCI
语种英语
公开日期2013-09-24
内容类型期刊论文
源URL[http://ir.iphy.ac.cn/handle/311004/49650]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Yang, WB,Kong X,Yang, S,et al. Nano-crystalline diamond films prepared by microwave argon plasma vapor deposition on optical glass[J]. VACUUM,2002,68(1):49.
APA Yang, WB,Kong X,Yang, S,Duan, XF,&Lu, FX.(2002).Nano-crystalline diamond films prepared by microwave argon plasma vapor deposition on optical glass.VACUUM,68(1),49.
MLA Yang, WB,et al."Nano-crystalline diamond films prepared by microwave argon plasma vapor deposition on optical glass".VACUUM 68.1(2002):49.
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