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Treatment of enterococcus faecalis bacteria by a helium atmospheric cold plasma brush with oxygen addition
Chen, W ; Huang, J ; Du, N ; Liu, XD ; Wang, XQ ; Lv, GH ; Zhang, GP ; Guo, LH ; Yang, SZ
刊名JOURNAL OF APPLIED PHYSICS
2012
卷号112期号:1
关键词DIELECTRIC BARRIER DISCHARGE STREPTOCOCCUS-MUTANS BACTERIA BIOMEDICAL APPLICATIONS PRESSURE NEEDLE SPECTROSCOPY TEMPERATURE
ISSN号0021-8979
通讯作者Chen, W (reprint author), Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Key Lab Soft Matter Phys, Beijing 100190, Peoples R China.
中文摘要An atmospheric cold plasma brush suitable for large area and low-temperature plasma-based sterilization is designed. Results demonstrate that the He/O-2 plasma more effectively kills Enterococcus faecalis than the pure He plasma. In addition, the sterilization efficiency values of the He/O-2 plasma depend on the oxygen fraction in Helium gas. The atmospheric cold plasma brush using a proper ratio of He/O-2 (2.5%) reaches the optimum sterilization efficiency. After plasma treatment, the cell structure and morphology changes can be observed by the scanning electron microscopy. Optical emission measurements indicate that reactive species such as O and OH play a significant role in the sterilization process. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4732135]
收录类别SCI
资助信息National Natural Science Foundation of China [11005151]
语种英语
公开日期2013-09-23
内容类型期刊论文
源URL[http://ir.iphy.ac.cn/handle/311004/46142]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Chen, W,Huang, J,Du, N,et al. Treatment of enterococcus faecalis bacteria by a helium atmospheric cold plasma brush with oxygen addition[J]. JOURNAL OF APPLIED PHYSICS,2012,112(1).
APA Chen, W.,Huang, J.,Du, N.,Liu, XD.,Wang, XQ.,...&Yang, SZ.(2012).Treatment of enterococcus faecalis bacteria by a helium atmospheric cold plasma brush with oxygen addition.JOURNAL OF APPLIED PHYSICS,112(1).
MLA Chen, W,et al."Treatment of enterococcus faecalis bacteria by a helium atmospheric cold plasma brush with oxygen addition".JOURNAL OF APPLIED PHYSICS 112.1(2012).
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