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Thickness dependence of surface plasmon damping and dispersion in ultrathin Ag films
Yu, YH ; Jiang, Y ; Tang, Z ; Guo, QL ; Jia, JF ; Xue, QK ; Wu, KH ; Wang, EG
刊名PHYSICAL REVIEW B
2005
卷号72期号:20
关键词GROWTH SI(111) NUCLEATION RESONANCE METALS SILVER
ISSN号1098-0121
通讯作者Wu, KH (reprint author), Chinese Acad Sci, State Key Lab Surface Phys, Inst Phys, POB 603-20, Beijing 100080, Peoples R China.
中文摘要The thickness dependence of the surface plasmon damping and dispersion of atomically flat and ultrathin silver films deposited on the Si(111)-(7x7) surface was investigated by a combined high-resolution electron-energy-loss spectroscopy (HREELS) and scanning tunneling microscopy (STM) system. We found stronger plasmon energy dispersion with the momentum parallel to the surface (q(parallel to)) in thicker films, and a significant dependence of the damping edge on the film thickness. Both of them can be associated with the presence of quantum well states (QWS) in the direction perpendicular to the film surface, which influences the interband transitions between the lower and upper 5sp bands of silver.
收录类别SCI
语种英语
公开日期2013-09-23
内容类型期刊论文
源URL[http://ir.iphy.ac.cn/handle/311004/45824]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Yu, YH,Jiang, Y,Tang, Z,et al. Thickness dependence of surface plasmon damping and dispersion in ultrathin Ag films[J]. PHYSICAL REVIEW B,2005,72(20).
APA Yu, YH.,Jiang, Y.,Tang, Z.,Guo, QL.,Jia, JF.,...&Wang, EG.(2005).Thickness dependence of surface plasmon damping and dispersion in ultrathin Ag films.PHYSICAL REVIEW B,72(20).
MLA Yu, YH,et al."Thickness dependence of surface plasmon damping and dispersion in ultrathin Ag films".PHYSICAL REVIEW B 72.20(2005).
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