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Metallic oxide p-I-n junctions with ferroelectric as the barrier
Yuan, J ; Wu, H ; Cao, LX ; Zhao, L ; Jin, K ; Zhu, BY ; Zhu, SJ ; Zhong, JP ; Miao, J ; Xu, B ; Qi, XY ; Qiu, XG ; Duan, XF ; Zhao, BR
刊名APPLIED PHYSICS LETTERS
2007
卷号90期号:10
ISSN号0003-6951
中文摘要The authors report the formation of the metallic oxide p-I-n junctions with the ferroelectric (Ba,Sr)TiO(3) (BST) as the barrier. The junctions with different thicknesses of BST are investigated. With appropriate thickness, the junctions possess definite parameters, such as the negligible reversed current density (<= 10(-7) A/cm(2)), large breakdown voltage (> 7 V), and ultrahigh rectification (> 2x10(4)) in the bias voltage <= 2.0 V and temperature range from 5 to 300 K. It is under consideration that the built-in field V(0), the ferroelectric reversed polarized field V(rp), and the resistivity of the BST layer together decide the transport properties of the junctions. (c) 2007 American Institute of Physics.
收录类别SCI
公开日期2013-09-18
内容类型期刊论文
源URL[http://ir.iphy.ac.cn/handle/311004/41927]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Yuan, J,Wu, H,Cao, LX,et al. Metallic oxide p-I-n junctions with ferroelectric as the barrier[J]. APPLIED PHYSICS LETTERS,2007,90(10).
APA Yuan, J.,Wu, H.,Cao, LX.,Zhao, L.,Jin, K.,...&Zhao, BR.(2007).Metallic oxide p-I-n junctions with ferroelectric as the barrier.APPLIED PHYSICS LETTERS,90(10).
MLA Yuan, J,et al."Metallic oxide p-I-n junctions with ferroelectric as the barrier".APPLIED PHYSICS LETTERS 90.10(2007).
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