Investigation of a new type nano carbon film prepared by high energy plasma assisted CVD

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	Investigation of a new type nano carbon film prepared by high energy plasma assisted CVD
	Yang, WB ; Fan, SH ; Ge, M ; Zhang, GL ; Shen, ZM ; Yang, SZ
刊名	ACTA PHYSICA SINICA
	2006
卷号	55 期号:1 页码:351
关键词	CHEMICAL-VAPOR-DEPOSITION AMORPHOUS-CARBON DIAMOND NANOTUBES RAMAN GROWTH
ISSN号	1000-3290
通讯作者	Yang, WB: China Univ Petr, Beijing 102249, Peoples R China.
中文摘要	Using self-fabricated equipment, new type carbon films with unfamiliar properties, high hardness and good electric conductivity were deposited on 1Cr18Ni9Ti substrate under deposition parameters of ion energy 2keV, pressure 2Pa, and methane ratio in hydrogen 10%. Process review shows that the substrate material is the key factor for the carbon films deposition, and the parameters of ion energy, pressure and methane ratio are impotent also. The grain size is less than 100nm and the film is smooth, dense and uniform as tested by AFM. Raman spectra show that there is only one broaden peak around 1580cm(-1). The sheet resistance of the film is 1.6 x 10(4) Omega/cm(2) as measured with the ohmmeter. The micro-hardness of the film is 21.38GPa and the bulk elasticity is 420.65GPa as tested by nano-indenter. It is concluded that there may be carbon chain structure in this film.
收录类别	SCI
语种	中文
公开日期	2013-09-18
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/40238]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Yang, WB,Fan, SH,Ge, M,et al. Investigation of a new type nano carbon film prepared by high energy plasma assisted CVD[J]. ACTA PHYSICA SINICA,2006,55(1):351.
APA	Yang, WB,Fan, SH,Ge, M,Zhang, GL,Shen, ZM,&Yang, SZ.(2006).Investigation of a new type nano carbon film prepared by high energy plasma assisted CVD.ACTA PHYSICA SINICA,55(1),351.
MLA	Yang, WB,et al."Investigation of a new type nano carbon film prepared by high energy plasma assisted CVD".ACTA PHYSICA SINICA 55.1(2006):351.