Effect of the addition of argon to reactive nitrogen gas on field emission properties of amorphous carbon nitride films

CORC > 物理研究所 > 物理所公开发表论文 > 期刊论文

	Effect of the addition of argon to reactive nitrogen gas on field emission properties of amorphous carbon nitride films
	Li, JJ ; Mimura, H ; Neo, Y ; Gu, CZ ; Li, HJ ; Chen, SX
刊名	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
	2006
卷号	24 期号:6 页码:2570
关键词	DIAMOND-LIKE CARBON THIN-FILMS PHOTOLUMINESCENCE
ISSN号	1071-1023
通讯作者	Li, JJ: Shizuoka Univ, Elect Res Inst, 3-5-1 Johoku, Hamamatsu, Shizuoka 4328011, Japan.
中文摘要	Amorphous carbon nitride films (a-CNx) were deposited as the electron field emitters by rf magnetron sputtering method at room temperature. The effect of adding Ar to reactive nitrogen gas on the field emission of a-CNx films is investigated. The addition of Ar increases the proportion and size of sp(2)-bonded clusters in the films and an overfull Ar addition decreases the N content in the film, measured by photoluminescence, x-ray photoelectron spectroscopy, and Raman spectra. Field emission testing results show that the Ar addition effectively improves the field emission ability of a-CNx films. Related to the change of chemical bonding structure and components in the films, the authors found that the enhanced field emission of the films was attributable to the increased proportion of sp2-bonded clusters, including sp(2) C-N and sp(2) C-C bondings, and the decreased N content in the film. As a conduction part of the amorphous network in the films, these rich as-formed sp(2)-bonded clusters not only enable the tunneling in the film to make electron emission easier but also lead to degrading the electron emission barriers and raising the Fermi level to enhance electron emission. (c) 2006 American Vacuum Society.
收录类别	SCI
语种	英语
公开日期	2013-09-17
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/36589]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Li, JJ,Mimura, H,Neo, Y,et al. Effect of the addition of argon to reactive nitrogen gas on field emission properties of amorphous carbon nitride films[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,2006,24(6):2570.
APA	Li, JJ,Mimura, H,Neo, Y,Gu, CZ,Li, HJ,&Chen, SX.(2006).Effect of the addition of argon to reactive nitrogen gas on field emission properties of amorphous carbon nitride films.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,24(6),2570.
MLA	Li, JJ,et al."Effect of the addition of argon to reactive nitrogen gas on field emission properties of amorphous carbon nitride films".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 24.6(2006):2570.