Double Temperature and Density Phenomenon in Grid Enhanced Plasma Source Ion Implantation for Inner Surface Modification of Tubes

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	Double Temperature and Density Phenomenon in Grid Enhanced Plasma Source Ion Implantation for Inner Surface Modification of Tubes
	Zhang, GL ; Wang, JL ; Jia, Y ; Zou, B ; Yang, SZ
刊名	PLASMA SCIENCE & TECHNOLOGY
	2009
卷号	11 期号:5 页码:555
关键词	DEPOSITION TIN
ISSN号	1009-0630
通讯作者	Zhang, GL: Cent Univ Nationalities, Sch Sci, Beijing 100081, Peoples R China.
中文摘要	Inner surface coating for tubular samples was realized by the grid enhanced plasma source ion implantation (GEPSII) method. In the GEPSII system, two electrodes, a central rod electrode and a coaxial grid electrode were coaxially assembled inside the tube. Plasma was generated between the electrodes by a radio-frequency (RF) oscillating power source. Plasma then diffused through the grid and realized inner surface ion implantation by a negative high voltage applied to the tube. The plasma was then divided, by the grid, into two regions, namely the source plasma region and the diffused plasma region. The plasma's self-bias between two RF power source electrodes was measured. At the same time, the electron temperature and plasma density in the GEPSII system were measured by a scattering spectrometer. Results showed that the plasma properties of the two regions were entirely different; the plasma self-bias, which might greatly affect the sputtering rate of the central titanium electrode, depended on the electrode structure, gas pressure and RF power.
收录类别	SCI
语种	英语
公开日期	2013-09-17
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/36215]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Zhang, GL,Wang, JL,Jia, Y,et al. Double Temperature and Density Phenomenon in Grid Enhanced Plasma Source Ion Implantation for Inner Surface Modification of Tubes[J]. PLASMA SCIENCE & TECHNOLOGY,2009,11(5):555.
APA	Zhang, GL,Wang, JL,Jia, Y,Zou, B,&Yang, SZ.(2009).Double Temperature and Density Phenomenon in Grid Enhanced Plasma Source Ion Implantation for Inner Surface Modification of Tubes.PLASMA SCIENCE & TECHNOLOGY,11(5),555.
MLA	Zhang, GL,et al."Double Temperature and Density Phenomenon in Grid Enhanced Plasma Source Ion Implantation for Inner Surface Modification of Tubes".PLASMA SCIENCE & TECHNOLOGY 11.5(2009):555.