Dielectric properties of Si-Ba0.5Sr0.5TiO3 composite thin films elaborated by pulsed laser deposition

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	Dielectric properties of Si-Ba0.5Sr0.5TiO3 composite thin films elaborated by pulsed laser deposition
	Cao, LZ ; Cheng, BL ; Wang, SY ; Zhou, YL ; Jin, KJ ; Lu, HB ; Chen, ZH ; Yang, GZ
刊名	JOURNAL OF APPLIED PHYSICS
	2005
卷号	98 期号:3
关键词	TUNABLE MICROWAVE DEVICES BARIUM STRONTIUM-TITANATE ENHANCED TUNABILITY IMPROVEMENT
ISSN号	0021-8979
通讯作者	Cheng, BL: Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, POB 603, Beijing 100080, Peoples R China.
中文摘要	Si-Ba0.5Sr0.5TiO3 composite thin films were deposited by pulsed laser deposition technique on (100) Nb:SrTiO3 substrates. The crystal structure and surface morphology of the thin films have been characterized by x-ray diffraction and atomic force microscopy, respectively. Experimental results suggested that the Si composition has played a positive role in improving the dielectric properties of the thin films. With the increased Si concentration, the dielectric loss was significantly reduced, accompanied with a tolerable reduction of tunability. In particular, the 14% Si composite film exhibited a dielectric loss of 0.005, which is much lower than that of the undoped Ba0.5Sr0.5TiO3 (BST) film. Moreover, a proper concentration of Si in the film improved the figure of merit from 9 of the undoped BST to 23 of 1.4% Si composite films. (c) 2005 American Institute of Physics.
收录类别	SCI
语种	英语
公开日期	2013-09-17
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/35931]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Cao, LZ,Cheng, BL,Wang, SY,et al. Dielectric properties of Si-Ba0.5Sr0.5TiO3 composite thin films elaborated by pulsed laser deposition[J]. JOURNAL OF APPLIED PHYSICS,2005,98(3).
APA	Cao, LZ.,Cheng, BL.,Wang, SY.,Zhou, YL.,Jin, KJ.,...&Yang, GZ.(2005).Dielectric properties of Si-Ba0.5Sr0.5TiO3 composite thin films elaborated by pulsed laser deposition.JOURNAL OF APPLIED PHYSICS,98(3).
MLA	Cao, LZ,et al."Dielectric properties of Si-Ba0.5Sr0.5TiO3 composite thin films elaborated by pulsed laser deposition".JOURNAL OF APPLIED PHYSICS 98.3(2005).