Controlled oxidative functionalization of monolayer graphene by water-vapor plasma etching | |
Liu, L ; Xie, DL ; Wu, MH ; Yang, XX ; Xu, Z ; Wang, WL ; Bai, XD ; Wang, EG | |
刊名 | CARBON
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2012 | |
卷号 | 50期号:8页码:3039 |
关键词 | FILMS OXIDE |
ISSN号 | 0008-6223 |
通讯作者 | Wang, WL: Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China. |
中文摘要 | We report studies on the controlled step-by-step oxidative functionalization of monolayer graphene by chemically reactive water-vapor plasma dry etching. The use of a porous mask on top of the graphene sheets as a filter is essential to reduce the density of free radicals and weaken the sputtering effect. Micro-Raman spectroscopy, X-ray photoelectron spectroscopy and atomic force microscopy showed that the oxidation occurred in a mild and controllable way, and that a wide variety of oxygen-containing functional groups can be evenly and incrementally incorporated onto the carbon lattice. By monitoring the electrical property changes in the graphene at different levels of oxidation, we observed a transformation of the electrical conduction process from continuum percolation to variable range hopping and/or electric-field-driven tunneling, due to the progressive increase of sp(3)-based basal plane distortion that disrupts the transport of carriers delocalized in the sp(2) carbon network. (C) 2012 Elsevier Ltd. All rights reserved. |
收录类别 | SCI |
资助信息 | NSF [10874218, 50725209, 91021007, 20973195]; MOST [2009DFA01290]; CAS of China [KJCX2-YW-M13, KJCX2-YW-W35] |
语种 | 英语 |
公开日期 | 2013-09-17 |
内容类型 | 期刊论文 |
源URL | [http://ir.iphy.ac.cn/handle/311004/35143] ![]() |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Liu, L,Xie, DL,Wu, MH,et al. Controlled oxidative functionalization of monolayer graphene by water-vapor plasma etching[J]. CARBON,2012,50(8):3039. |
APA | Liu, L.,Xie, DL.,Wu, MH.,Yang, XX.,Xu, Z.,...&Wang, EG.(2012).Controlled oxidative functionalization of monolayer graphene by water-vapor plasma etching.CARBON,50(8),3039. |
MLA | Liu, L,et al."Controlled oxidative functionalization of monolayer graphene by water-vapor plasma etching".CARBON 50.8(2012):3039. |
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