Concentration microprofiles in iron silicides induced by low energy Ar+ ion bombardment

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	Concentration microprofiles in iron silicides induced by low energy Ar+ ion bombardment
	Cao, ZX ; Oechsner, H
刊名	NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
	2000
卷号	168 期号:2 页码:192
关键词	SURFACES
ISSN号	0168-583X
通讯作者	Cao, ZX: Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, POB 603, Beijing 100080, Peoples R China.
中文摘要	Auger electron spectroscopy (AES) in conjunction with sputter removal by Ar+ ions of only 120 eV has been used to determine the concentration microprofiles generated in polycrystalline Fe3Si, FeSi and FeSi2 samples by a preceding bombardment with Ar+ ions of 1-5 keV. The conversion of the surface sensitive AES ptp-signals measured in dependence of the profiling ion fluence into concentration-versus-depth profiles was facilitated by the fact that the bombardment-induced stoichiometry changes had no noticeable influence on the relative AES detection factors between Si and Fe. The concentration microprofiles extended up to about 16 nm into the solid, and displayed a rather uniform behaviour with a pronounced minimum of the Si concentration at 1-2 nm. Their characteristic features are related to the mean projected ranges of the keV-projectiles in the different iron silicides, and are assumed to provide direct experimental information on the corresponding deposited energy functions. (C) 2000 Elsevier Science B.V. All rights reserved.
收录类别	SCI
语种	英语
公开日期	2013-09-17
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/35029]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Cao, ZX,Oechsner, H. Concentration microprofiles in iron silicides induced by low energy Ar+ ion bombardment[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,2000,168(2):192.
APA	Cao, ZX,&Oechsner, H.(2000).Concentration microprofiles in iron silicides induced by low energy Ar+ ion bombardment.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,168(2),192.
MLA	Cao, ZX,et al."Concentration microprofiles in iron silicides induced by low energy Ar+ ion bombardment".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 168.2(2000):192.