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Classical and quantum control of a simple quantum system
Xi, Z ; Jin, GS
刊名INTERNATIONAL JOURNAL OF QUANTUM INFORMATION
2007
卷号5期号:6页码:857
ISSN号0219-7499
中文摘要An epitaxial-Mg2SiO4 thin film can be a good buff. er between the Si substrate and some oxide thin filmsfor high temperature superconducting multilayer structures, hopefully it can be taken as an insulating layer to replace the widely used MgO film. To explore such possibilities, we carry out systematic studies on the influences of pressure and substrate temperature on the epitaxy of gamma- Mg2SiO4 thin films grown on Si (100) substrates using rf magnetron sputtering with an Mg target of purity of 99.95 percent. With the substrate temperature kept at 500 degrees C and the pressure changing from 10Pa to 15Pa, in the XRD spectra the gamma-Mg2SiO4 (400) peak grows drastically while the MgO (200) peak is suppressed. Keeping the pressure at 15 Pa and increasing the temperature from 500 degrees C to 570 degrees C further can improve thefilm epitaxy, while working at 780 degrees C and 11 Pa seems to give very good results. X- ray photoelectronic spectroscopy and phi scan are used to characterize the stoichiometry, crystallinity, and in- plane growth of the samples.
收录类别SCI
公开日期2013-09-17
内容类型期刊论文
源URL[http://ir.iphy.ac.cn/handle/311004/34743]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
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GB/T 7714
Xi, Z,Jin, GS. Classical and quantum control of a simple quantum system[J]. INTERNATIONAL JOURNAL OF QUANTUM INFORMATION,2007,5(6):857.
APA Xi, Z,&Jin, GS.(2007).Classical and quantum control of a simple quantum system.INTERNATIONAL JOURNAL OF QUANTUM INFORMATION,5(6),857.
MLA Xi, Z,et al."Classical and quantum control of a simple quantum system".INTERNATIONAL JOURNAL OF QUANTUM INFORMATION 5.6(2007):857.
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