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Characterization of diphasic nc-Si/a-Si : H thin films and solar cells
Zhang, SB ; Xu, YY ; Hu, ZH ; Wang, YQ ; Zeng, XB ; Diao, HW ; Wang, WJ ; Kong, GL ; Liao, XB
刊名CONFERENCE RECORD OF THE TWENTY-NINTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE 2002
2002
页码1182
关键词SILICON RAMAN
通讯作者Zhang, SB: Chinese Acad Sci, Inst Semicond, State Lab Surface Phys, Beijing 100083, Peoples R China.
中文摘要Hydrogenated silicon films with diphasic structure have been prepared by using a new regime of plasma enhanced chemical vapor deposition (PECVD) in the region adjacent to the phase transition from amorphous to crystal. line state. The photoelectronic and microstructural properties of the films have been characterized by the constant photocurrent method (CPM), Raman scattering and nuclear magnetic resonance (NMR). In comparison with typical hydrogenated amorphous silicon (a-Si:H), these diphasic films with a crystalline fraction less than 0.3 show a similar optical absorption coefficient, lower deep-defect densities and higher stability upon light soaking. By using the diphasic nc-Si/a-Si films a p-i-n junction solar cell has been prepared With an initial efficiency of 8.51 % and a stabilized efficiency of 8.02 % on an area of 0.126 cm(2) (AM1.5, 100 mW/cm(2)).
收录类别SCI
语种英语
公开日期2013-09-17
内容类型期刊论文
源URL[http://ir.iphy.ac.cn/handle/311004/34633]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Zhang, SB,Xu, YY,Hu, ZH,et al. Characterization of diphasic nc-Si/a-Si : H thin films and solar cells[J]. CONFERENCE RECORD OF THE TWENTY-NINTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE 2002,2002:1182.
APA Zhang, SB.,Xu, YY.,Hu, ZH.,Wang, YQ.,Zeng, XB.,...&Liao, XB.(2002).Characterization of diphasic nc-Si/a-Si : H thin films and solar cells.CONFERENCE RECORD OF THE TWENTY-NINTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE 2002,1182.
MLA Zhang, SB,et al."Characterization of diphasic nc-Si/a-Si : H thin films and solar cells".CONFERENCE RECORD OF THE TWENTY-NINTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE 2002 (2002):1182.
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