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Atomically smooth ultrathin films of topological insulator Sb2Te3
Wang, GA ; Zhu, XG ; Wen, J ; Chen, X ; He, K ; Wang, LL ; Ma, XC ; Liu, Y ; Dai, X ; Fang, Z ; Jia, JF ; Xue, QK
刊名NANO RESEARCH
2010
卷号3期号:12页码:874
关键词SINGLE DIRAC CONE BI2TE3 CRYSTALS SURFACE-STATES DOPED SB2TE3 THIN-FILMS TRANSPORT DEFECTS BI2SE3 GROWTH LIMIT
ISSN号1998-0124
通讯作者Jia, JF: Tsinghua Univ, Dept Phys, Key Lab Atom Mol & Nanosci, Beijing 100084, Peoples R China.
中文摘要The growth and characterization of single-crystalline thin films of topological insulators (TIs) is an important step towards their possible applications. Using in situ scanning tunneling microscopy (STM) and angle-resolved photoemission spectroscopy (ARPES), we show that moderately thick Sb2Te3 films grown layer-by-layer by molecular beam epitaxy (MBE) on Si(111) are atomically smooth, single-crystalline, and intrinsically insulating. Furthermore, these films were found to exhibit a robust TI electronic structure with their Fermi energy lying within the energy gap of the bulk that intersects only the Dirac cone of the surface states. Depositing Cs in situ moves the Fermi energy of the Sb2Te3 films without changing the electronic band structure, as predicted by theory. We found that the TI behavior is preserved in Sb2Te3 films down to five quintuple layers (QLs).
收录类别SCI
资助信息National Natural Science Foundation of China (NSFC); Ministry of Science and Technology of China (MOST); National Science Foundation (NSF) [DMR 0908700]
语种英语
公开日期2013-09-17
内容类型期刊论文
源URL[http://ir.iphy.ac.cn/handle/311004/34047]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Wang, GA,Zhu, XG,Wen, J,et al. Atomically smooth ultrathin films of topological insulator Sb2Te3[J]. NANO RESEARCH,2010,3(12):874.
APA Wang, GA.,Zhu, XG.,Wen, J.,Chen, X.,He, K.,...&Xue, QK.(2010).Atomically smooth ultrathin films of topological insulator Sb2Te3.NANO RESEARCH,3(12),874.
MLA Wang, GA,et al."Atomically smooth ultrathin films of topological insulator Sb2Te3".NANO RESEARCH 3.12(2010):874.
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