Analysis of step etching on SrTiO3 substrates for the step-edge YBCO Josephson junctions

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	Analysis of step etching on SrTiO3 substrates for the step-edge YBCO Josephson junctions
	Chen, GH ; Wang, J ; Zhao, SP ; Han, B ; Xu, FZ ; Yang, QS
刊名	CHINESE PHYSICS LETTERS
	2001
卷号	18 期号:1 页码:106
关键词	MICROSTRUCTURE
ISSN号	0256-307X
通讯作者	Chen, GH: Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China.
中文摘要	A way to determine some important etching parameters in the step fabrication for high T-c step-edge Josephson junctions is described based on an analysis of the dynamics of the etching process. The optimum thickness of the etch mask is defined with negligible recession of the mask edge during the etch. Under this condition, the equilibrium angle of the steps etched on the SrTiO3 (STO) substrate with an Nb mask has been calculated to be about 76 degrees. With optimized mask thickness, its sharp sidewall and straight edge, high-quality steps on STO substrates with step height from 200-300nm and step angle above 70 degrees are made. Josephson junctions and dc-SQUIDs with high reproducibility and less parameter scatter are obtained on the step substrates.
收录类别	SCI
语种	英语
公开日期	2013-09-17
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/33709]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Chen, GH,Wang, J,Zhao, SP,et al. Analysis of step etching on SrTiO3 substrates for the step-edge YBCO Josephson junctions[J]. CHINESE PHYSICS LETTERS,2001,18(1):106.
APA	Chen, GH,Wang, J,Zhao, SP,Han, B,Xu, FZ,&Yang, QS.(2001).Analysis of step etching on SrTiO3 substrates for the step-edge YBCO Josephson junctions.CHINESE PHYSICS LETTERS,18(1),106.
MLA	Chen, GH,et al."Analysis of step etching on SrTiO3 substrates for the step-edge YBCO Josephson junctions".CHINESE PHYSICS LETTERS 18.1(2001):106.