A novel vacuum process for OH addition to polystyrene, polyethylene, and Teflon(TM)

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	A novel vacuum process for OH addition to polystyrene, polyethylene, and Teflon(TM)
	Sun, JQ ; Bello, I ; Bederka, S ; Lau, WM ; Lin, ZD
刊名	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
	1996
卷号	14 期号:3 页码:1382
关键词	SURFACE
ISSN号	0734-2101
通讯作者	Sun, JQ: UNIV WESTERN ONTARIO,DEPT MAT ENGN,LONDON,ON N6A 5B7,CANADA.
中文摘要	A special vacuum process has been developed for adding an OH functional group onto polymer surfaces with different reactivities. In this novel technique, polymer surfaces were exposed, in a vacuum chamber, to OH radicals generated by the dissociation of water vapor on hot rhenium wires. We found by x-ray photoelectron spectroscopy and high resolution electron energy loss spectroscopy that about half a monolayer equivalent of C-OH groups could be generated on a relatively reactive polymer like polystyrene with a 10 s exposure at a water pressure of 1x10(-3) Torr. However, under the same experimental conditions, the oxygen incorporation on more stable polymers was much lower; it was reduced by 90% on polyethylene and to practically zero on Teflon. For surface engineering of these stable polymers, thermionic electrons emitted from the hot filaments were used to facilitate electron impact ionization of some of the water vapor. Positive ions from the ionization region were then extracted and accelerated by an electrostatic field toward the polymer target which was separated from the ionization region by an adjustable distance about twice the gas-phase collision mean-free path. Although ion bombardment of the polymer surface was limited by the insulating property of the polymer, ion-molecule collisions in the gas phase were efficient with such a setup in generating energetic neutrals flying toward the polymer surface for the activation of the polymer. With an accelerating voltage of 50 V and a water pressure of 1 x 10(-3) Torr (the collision mean-free path being about 5 cm), about a 0.2 monolayer equivalent of COH was added to Teflon and polyethylene in 60 s. (C) 1996 American Vacuum Society.
收录类别	SCI
语种	英语
公开日期	2013-09-17
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/33151]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Sun, JQ,Bello, I,Bederka, S,et al. A novel vacuum process for OH addition to polystyrene, polyethylene, and Teflon(TM)[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,1996,14(3):1382.
APA	Sun, JQ,Bello, I,Bederka, S,Lau, WM,&Lin, ZD.(1996).A novel vacuum process for OH addition to polystyrene, polyethylene, and Teflon(TM).JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,14(3),1382.
MLA	Sun, JQ,et al."A novel vacuum process for OH addition to polystyrene, polyethylene, and Teflon(TM)".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 14.3(1996):1382.