A silica co-electrodeposition route to highly active Ni-based film electrodes

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	A silica co-electrodeposition route to highly active Ni-based film electrodes
	L. K. Wu ; J. M. Hu ; J. Q. Zhang ; C. N. Cao
刊名	Journal of Materials Chemistry A
	2013
卷号	1 期号:41 页码:12885-12892
关键词	oxygen-evolving catalyst water oxidation catalysts sol-gel films thin-films electrochemical codeposition supercapacitive properties corrosion protection nanocomposite films evolution reaction fuel-cells
ISSN号	2050-7488
原文出处	://WOS:000325413000026
语种	英语
公开日期	2013-12-24
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/71584]
专题	金属研究所_中国科学院金属研究所
推荐引用方式 GB/T 7714	L. K. Wu,J. M. Hu,J. Q. Zhang,et al. A silica co-electrodeposition route to highly active Ni-based film electrodes[J]. Journal of Materials Chemistry A,2013,1(41):12885-12892.
APA	L. K. Wu,J. M. Hu,J. Q. Zhang,&C. N. Cao.(2013).A silica co-electrodeposition route to highly active Ni-based film electrodes.Journal of Materials Chemistry A,1(41),12885-12892.
MLA	L. K. Wu,et al."A silica co-electrodeposition route to highly active Ni-based film electrodes".Journal of Materials Chemistry A 1.41(2013):12885-12892.