Argon ion beam assisted magnetron sputtering deposition of boron-doped a-Si:H thin films with improved conductivity

CORC > 宁波材料技术与工程研究所 > 中国科学院宁波材料技术与工程研究所 > 宁波所知识产出

	Argon ion beam assisted magnetron sputtering deposition of boron-doped a-Si:H thin films with improved conductivity
	Jianmin Chen ; Linqing Wang a,d, Weiyan Wang b, Junjun Huang b, Yuheng Zeng b, Ruiqin Tan c, Weijie Song b, Jianmin Chen a,⁎
刊名	J. Non-Cryst. Solids
	2013-10-15
期号	1 页码:177—180
通讯作者	Jianmin Chen
合作状况	李雨桐
中文摘要	Boron-doped a-Si:H thin films were deposited by ion beam assisted magnetron sputtering under different assisted argon ion beam energies, and the changes of structural and electrical properties of the thin films were investigated using Raman spectroscopy, spectroscopic ellipsometry and semiconductor parameter measurement system. It was observed that the short-range order of boron-doped a-Si:H thin films decreased slightly and the defect density of thin films increased with increasing assisted argon ion beam energy. The dark conductivity of boron-doped a-Si:H thin films improved significantly with increasing assisted argon ion beam energy. The conductivity of the boron-doped a-Si:H thin films with 500 eV argon ion beam bombardment was 2.1 × 10？7 S·cm？1, which was about three orders of magnitude higher than that of the thin films deposited without assisted ion beam. The significant change in conductivity of the boron-doped a-Si:H thin films deposited with assisted argon ion beam was mainly ascribed to the activation of threefold coordinated boron atoms.
学科主题	物理化学
原文出处	SCI收录
公开日期	2013-12-16
内容类型	期刊论文
源URL	[http://ir.nimte.ac.cn/handle/174433/10066]
专题	宁波材料技术与工程研究所_宁波所知识产出
推荐引用方式 GB/T 7714	Jianmin Chen,Linqing Wang a,d, Weiyan Wang b, Junjun Huang b, Yuheng Zeng b, Ruiqin Tan c, Weijie Song b, Jianmin Chen a,⁎. Argon ion beam assisted magnetron sputtering deposition of boron-doped a-Si:H thin films with improved conductivity[J]. J. Non-Cryst. Solids,2013(1):177—180.
APA	Jianmin Chen,&Linqing Wang a,d, Weiyan Wang b, Junjun Huang b, Yuheng Zeng b, Ruiqin Tan c, Weijie Song b, Jianmin Chen a,⁎.(2013).Argon ion beam assisted magnetron sputtering deposition of boron-doped a-Si:H thin films with improved conductivity.J. Non-Cryst. Solids(1),177—180.
MLA	Jianmin Chen,et al."Argon ion beam assisted magnetron sputtering deposition of boron-doped a-Si:H thin films with improved conductivity".J. Non-Cryst. Solids .1(2013):177—180.