Resistive switching effects in oxide sandwiched structures
Li RW(李润伟) ; Xiao-Jian ZHU1,2, Jie SHANG1,2, and Run-Wei LI (✉)1,2
刊名Front. Mater. Sci.
2012-05-24
卷号14页码:1—24
通讯作者李润伟
合作状况李雨桐
中文摘要Resistive switching (RS) behaviors have attracted great interest due to their promising potential for the data storage. Among various materials, oxide-based devices appear to be more advantageous considering their handy fabrication and compatibility with CMOS technology, though the underlying mechanism is still controversial due to the diversity of RS behaviors. In this review, we focus on the oxide-based RS memories, in which the working mechanism can be understood basically according to a so-called filament model. The filaments formation/rupture processes, approaches developed to detect and characterize filaments, several effective attempts to improve the performances of RS and the quantum conductance behaviors in oxide-based resistive random access memory (RRAM) devices are addressed, respectively
学科主题磁电子材料与器件组
原文出处SCI收录
公开日期2013-12-16
内容类型期刊论文
源URL[http://ir.nimte.ac.cn/handle/174433/9621]  
专题宁波材料技术与工程研究所_宁波所知识产出
推荐引用方式
GB/T 7714
Li RW,Xiao-Jian ZHU1,2, Jie SHANG1,2, and Run-Wei LI . Resistive switching effects in oxide sandwiched structures[J]. Front. Mater. Sci.,2012,14:1—24.
APA Li RW,&Xiao-Jian ZHU1,2, Jie SHANG1,2, and Run-Wei LI .(2012).Resistive switching effects in oxide sandwiched structures.Front. Mater. Sci.,14,1—24.
MLA Li RW,et al."Resistive switching effects in oxide sandwiched structures".Front. Mater. Sci. 14(2012):1—24.
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