Effect of deposition condition and UV-ozone post-treatment on work function of DC magnetron sputtered AZO thin films | |
Song WJ(宋伟杰) ; Quanyu Feng • Weiyan Wang • Kemin Jiang • Jinhua Huang • Yulong Zhang • Weijie Song • Ruiqin Tan | |
刊名 | J Mater Sci: Mater Electron |
2012-05-12 | |
期号 | 23页码:267—272 |
通讯作者 | 宋伟杰 |
合作状况 | 李雨桐 |
中文摘要 | Highly transparent and conductive aluminumdoped zinc oxide (AZO) thin films were successfully deposited on glass by DC magnetron sputtering. The effects of Al-doping content (1–4 at.%), substrate temperature (250–350 C) and ultraviolet (UV)-ozone treatment time (0–20 min) on AZO film work function were systematically investigated. It was revealed that the AZO work function increased with the decrease of Al content, while it was almost insensitive to the substrate temperature. Moreover, the UV-ozone treatment significantly improved AZO work function, while the post-treatment time had no effect on AZO work function. Two factors, [OZnAl]/([Zn] ? 1.5[Al]) ratio and carbon contamination on film surface, affected the AZO work function. It was suggested that AZO films with high [OZnAl]/([Zn] ? 1.5[Al]) ratio and reduced carbon concentration, possessed high work function. |
学科主题 | 物理化学 |
原文出处 | SCI收录 |
公开日期 | 2013-12-16 |
内容类型 | 期刊论文 |
源URL | [http://ir.nimte.ac.cn/handle/174433/9617] |
专题 | 宁波材料技术与工程研究所_宁波所知识产出 |
推荐引用方式 GB/T 7714 | Song WJ,Quanyu Feng • Weiyan Wang • Kemin Jiang • Jinhua Huang • Yulong Zhang • Weijie Song • Ruiqin Tan. Effect of deposition condition and UV-ozone post-treatment on work function of DC magnetron sputtered AZO thin films[J]. J Mater Sci: Mater Electron,2012(23):267—272. |
APA | Song WJ,&Quanyu Feng • Weiyan Wang • Kemin Jiang • Jinhua Huang • Yulong Zhang • Weijie Song • Ruiqin Tan.(2012).Effect of deposition condition and UV-ozone post-treatment on work function of DC magnetron sputtered AZO thin films.J Mater Sci: Mater Electron(23),267—272. |
MLA | Song WJ,et al."Effect of deposition condition and UV-ozone post-treatment on work function of DC magnetron sputtered AZO thin films".J Mater Sci: Mater Electron .23(2012):267—272. |
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