pattern-based recognition for determination of enantiomeric excess,     using chiral auxiliary induced chemical shift perturbation nmr

CORC > 宁波材料技术与工程研究所 > 中国科学院宁波材料技术与工程研究所 > 宁波所知识产出

	pattern-based recognition for determination of enantiomeric excess, using chiral auxiliary induced chemical shift perturbation nmr
	Lei Xinxiang ; Liu Lu ; Chen Xiaojing ; Yu Xiaochun ; Ding Lisheng ; Zhang Anjiang
刊名	ORGANIC LETTERS
	2010
卷号	12 期号:11 页码:2540-2543
ISSN号	1523-7060
学科主题	Chemistry, Organic
收录类别	SCI
语种	英语
公开日期	2011-05-10
附注	A protocol for the determination of enantiomeric excess of chiral carboxylic acid, using the subtle frequency shifts (chemical shift perturbation) in NMR spectra induced by chiral auxiliary, is described. The spectra were analyzed with two pattern recognition protocols. Principal component analysis demonstrated good enantioselective separation of the analytes, and partial least-squares was used to analyze ee values of unknown samples.
内容类型	期刊论文
源URL	[http://ir.nimte.ac.cn/handle/174433/1608]
专题	宁波材料技术与工程研究所_宁波所知识产出
推荐引用方式 GB/T 7714	Lei Xinxiang,Liu Lu,Chen Xiaojing,et al. pattern-based recognition for determination of enantiomeric excess, using chiral auxiliary induced chemical shift perturbation nmr[J]. ORGANIC LETTERS,2010,12(11):2540-2543.
APA	Lei Xinxiang,Liu Lu,Chen Xiaojing,Yu Xiaochun,Ding Lisheng,&Zhang Anjiang.(2010).pattern-based recognition for determination of enantiomeric excess, using chiral auxiliary induced chemical shift perturbation nmr.ORGANIC LETTERS,12(11),2540-2543.
MLA	Lei Xinxiang,et al."pattern-based recognition for determination of enantiomeric excess, using chiral auxiliary induced chemical shift perturbation nmr".ORGANIC LETTERS 12.11(2010):2540-2543.