Deep Metric Learning with Cross-Writer Attention for Offline Signature Verification
Ling LR(凌禄蓉); Zhang H(张恒); Yin F(殷飞); Liu CL(刘成林)
刊名ICDAR2024
2024
页码1
文献子类国际会议
英文摘要

Signature veriffcation is a biometric and document forensics technology useful for personal identiffcation in various security applications. Signature veriffcation in the writer-independent scenario remains a challenge, particularly in distinguishing between genuine signatures and skilled forgeries. In this paper, we propose a writer-independent signature veriffcation method based on deep metric learning with cross-writer attention. Our cross-writer attention module includes two parts: SimAM (a Simple, Parameter-Free Attention Module), as well as the cross-attention mechanism. SimAM is combined with each DenseBlock to interact information of two inputs, which makes the learned weights better account for the difference between two input signatures. Cross-attention aligns global and local information in learned feature representations of two input signatures. Further, we introduce a focal contrast loss function for deep metric learning to overcome the sample imbalance. Extensive experiments demonstrate the effectiveness of the proposed method, which achieves superior performance on several public datasets and also indicates the effectiveness of each module.
 

内容类型期刊论文
源URL[http://ir.ia.ac.cn/handle/173211/57524]  
专题自动化研究所_模式识别国家重点实验室_模式分析与学习团队
推荐引用方式
GB/T 7714
Ling LR,Zhang H,Yin F,et al. Deep Metric Learning with Cross-Writer Attention for Offline Signature Verification[J]. ICDAR2024,2024:1.
APA Ling LR,Zhang H,Yin F,&Liu CL.(2024).Deep Metric Learning with Cross-Writer Attention for Offline Signature Verification.ICDAR2024,1.
MLA Ling LR,et al."Deep Metric Learning with Cross-Writer Attention for Offline Signature Verification".ICDAR2024 (2024):1.
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