Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C: H films deposited by mid-frequency magnetron sputtering

doi:10.1016/j.surfcoat.2013.12.067

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	Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C: H films deposited by mid-frequency magnetron sputtering
	Jiang, Jinlong 1,2; Wang, Qiong 1; Huang, Hao 1; Wang, Yubao 1; Zhang, Xia 1; Hao, Junying 2
刊名	Surface and Coatings Technology
	2014-02-15
卷号	240 页码:419-424
关键词	Amorphous carbon Amorphous silicon Carbon films Magnetron sputtering Microstructure Rotation Substrates Surface morphology a-C:H films Hydrogenated amorphous carbon (a-C:H) MF magnetron sputtering Microstructure and properties Rotary substrates Rotating substrates Shadowing effects Substrate rotation
ISSN号	02578972
DOI	10.1016/j.surfcoat.2013.12.067
英文摘要	Ti and Si dual-doped hydrogenated amorphous carbon (a-C:H) films were synthesized by mid-frequency (MF) magnetron sputtering with stationary and rotary substrates. The effects of substrate rotation on the microstructure, surface morphology, internal stress and mechanical properties were investigated. The results show that substrate rotation plays an important role in the growth of the a-C:H films. The film deposited on rotary substrate has a higher sp2 content with high degree of bond disorder and relatively low H content, thus resulting in much lower compressive stress and high hardness. The structural changes induced by the substrate rotation are discussed in terms of subplantation and migration roles of incident species in growth of the films. Moreover, the film deposited on rotary substrate shows smoother surface with small and dense particles, which is attributed to suppressing the shadowing effect by rotating substrate. © 2013 Elsevier B.V.
资助项目	Excellent Young Teachers Program of Lanzhou University of Technology[1010ZCX010]
WOS研究方向	Materials Science ; Physics
语种	英语
出版者	Elsevier B.V.
WOS记录号	WOS:000331989900057
状态	已发表
内容类型	期刊论文
源URL	[http://ir.lut.edu.cn/handle/2XXMBERH/113605]
专题	理学院
通讯作者	Jiang, Jinlong
作者单位	1.Lanzhou Univ Technol, Dept Phys, Lanzhou 730050, Peoples R China 2.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
推荐引用方式 GB/T 7714	Jiang, Jinlong,Wang, Qiong,Huang, Hao,et al. Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C: H films deposited by mid-frequency magnetron sputtering[J]. Surface and Coatings Technology,2014,240:419-424.
APA	Jiang, Jinlong,Wang, Qiong,Huang, Hao,Wang, Yubao,Zhang, Xia,&Hao, Junying.(2014).Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C: H films deposited by mid-frequency magnetron sputtering.Surface and Coatings Technology,240,419-424.
MLA	Jiang, Jinlong,et al."Microstructure and property changes induced by substrate rotation in titanium/silicon dual-doped a-C: H films deposited by mid-frequency magnetron sputtering".Surface and Coatings Technology 240(2014):419-424.