Structure and characteristics of amorphous (Ti,Si)-C:H films deposited by reactive magnetron sputtering

doi:10.1016/j.diamond.2010.05.005

CORC > 兰州理工大学 > 兰州理工大学 > 理学院

	Structure and characteristics of amorphous (Ti,Si)-C:H films deposited by reactive magnetron sputtering
	Jiang, Jinlong 1,2,3; Hao, Junying 1; Pang, Xianjuan 1,2; Wang, Peng 1; Liu, Weimin 1
刊名	DIAMOND AND RELATED MATERIALS
	2010-10
卷号	19 期号:10 页码:1172-1177
关键词	Amorphous hydrogenated carbon Doping Microstructure Superlow friction
ISSN号	0925-9635
DOI	10.1016/j.diamond.2010.05.005
英文摘要	The hydrogenated amorphous carbon films doped with Ti and Si ((Ti,Si)-C:H) were deposited on silicon substrates using reactive magnetron sputtering Ti(80)Si(20) composite target in an argon and methane gas mixture. The structures of the films were analyzed by X-ray photoelectron spectroscopy and Visible Raman spectroscopy. The morphologies were observed by atomic force microscope. The friction coefficients of the films were tested on the ball-on-disc tribometer. The results indicate that the sp(3)/sp(2) ratios in the films can be varied from 0.18 to 0.63 by changing Ti and Si contents at various CH(4) flow rates. The surface of the films becomes smoother and more compact as the CH4 flow rate increases. The lowest friction coefficient is as low as 0.0139 for the film with Ti of 4.5 at.% and Si of 1.0 at.%. Especially, the film exhibits a superlow value (mu<0.01) under ambient air with 40% relative humidity in friction process. The superlow friction coefficient in ambient air may be, attributable to synergistic effects of a combination of Ti and Si in the film. Crown Copyright (c) 2010 Published by Elsevier B.V. All rights reserved.
资助项目	Ministry of Science and Technology of China[2007CB607601]
WOS研究方向	Materials Science ; Physics
语种	英语
出版者	ELSEVIER SCIENCE SA
WOS记录号	WOS:000282203300008
状态	已发表
内容类型	期刊论文
源URL	[http://119.78.100.223/handle/2XXMBERH/35198]
专题	理学院
通讯作者	Liu, Weimin
作者单位	1.Chinese Acad Sci, State Key Lab Solid Lubricat, Lanzhou Inst Chem Phys, Lanzhou 730000, Peoples R China 2.Lanzhou Univ Technol, Dept Phys, Lanzhou 730050, Peoples R China 3.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China
推荐引用方式 GB/T 7714	Jiang, Jinlong,Hao, Junying,Pang, Xianjuan,et al. Structure and characteristics of amorphous (Ti,Si)-C:H films deposited by reactive magnetron sputtering[J]. DIAMOND AND RELATED MATERIALS,2010,19(10):1172-1177.
APA	Jiang, Jinlong,Hao, Junying,Pang, Xianjuan,Wang, Peng,&Liu, Weimin.(2010).Structure and characteristics of amorphous (Ti,Si)-C:H films deposited by reactive magnetron sputtering.DIAMOND AND RELATED MATERIALS,19(10),1172-1177.
MLA	Jiang, Jinlong,et al."Structure and characteristics of amorphous (Ti,Si)-C:H films deposited by reactive magnetron sputtering".DIAMOND AND RELATED MATERIALS 19.10(2010):1172-1177.