Theoretical study of multiexposure zeroth-order waveguide mode interference lithography

doi:10.1007/s11082-018-1601-2

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	Theoretical study of multiexposure zeroth-order waveguide mode interference lithography
	Pang, Zhiyuan 1; Tong, Huan 1; Wu, Xiaoxiong 1; Zhu, Jiankai 1; Wang, Xiangxian 1; Yang, Hua 1; Qi, Yunping 2
刊名	OPTICAL AND QUANTUM ELECTRONICS
	2018-09
卷号	50 期号:9
关键词	Nanolithography Subwavelength structure Waveguide mode Sample rotation
ISSN号	0306-8919
DOI	10.1007/s11082-018-1601-2
英文摘要	A new nanolithography technique in which sample rotation is incorporated into zeroth-order waveguide mode interference lithography is proposed in this report. A 325-nm laser was used to excite zeroth-order waveguide modes, which were loaded by an asymmetric metal-cladding dielectric waveguide structure. The optical field intensity distribution of zeroth-order waveguide modes interference is numerically simulated using the finite element method. The lithography sample consisted of a glass substrate, Al film, and photoresist film, and the rotation operation on the sample is expressed in coordinate matrix transformation. Various subwavelength structures, such as two-dimensional square lattices, two-dimensional hexagonal closed-packed lattices,and circular gratings, were obtained through double, triple, and continuous exposure. These subwavelength structures with different sizes can be produced by changing the thickness of the photoresist. The subwavelength structures simulated with various shapes and sizes can be applied to the field of nano-optics. The proposed technique provides a flexible and promising approach for interference nanolithography because of its simplicity and low cost.
资助项目	National Undergraduate Innovation Training Program of China[201610731030]
WOS研究方向	Engineering ; Physics ; Optics
语种	英语
出版者	SPRINGER
WOS记录号	WOS:000442130500004
状态	已发表
内容类型	期刊论文
源URL	[http://119.78.100.223/handle/2XXMBERH/32486]
专题	理学院
通讯作者	Wang, Xiangxian
作者单位	1.Lanzhou Univ Technol, Sch Sci, Lanzhou 730050, Gansu, Peoples R China 2.Northwest Normal Univ, Coll Phys & Elect Engn, Lanzhou 730070, Gansu, Peoples R China
推荐引用方式 GB/T 7714	Pang, Zhiyuan,Tong, Huan,Wu, Xiaoxiong,et al. Theoretical study of multiexposure zeroth-order waveguide mode interference lithography[J]. OPTICAL AND QUANTUM ELECTRONICS,2018,50(9).
APA	Pang, Zhiyuan.,Tong, Huan.,Wu, Xiaoxiong.,Zhu, Jiankai.,Wang, Xiangxian.,...&Qi, Yunping.(2018).Theoretical study of multiexposure zeroth-order waveguide mode interference lithography.OPTICAL AND QUANTUM ELECTRONICS,50(9).
MLA	Pang, Zhiyuan,et al."Theoretical study of multiexposure zeroth-order waveguide mode interference lithography".OPTICAL AND QUANTUM ELECTRONICS 50.9(2018).