Theoretical study of subwavelength circular grating fabrication based on continuously exposed surface plasmon interference lithography

doi:10.1016/j.rinp.2019.102446

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	Theoretical study of subwavelength circular grating fabrication based on continuously exposed surface plasmon interference lithography
	Wang, Xiangxian 1; Pang, Zhiyuan 1; Yang, Hua 1; Qi, Yunping 2
刊名	RESULTS IN PHYSICS
	2019-09
卷号	14
关键词	Nanolithography Subwavelength circular grating Surface plasmon
ISSN号	2211-3797
DOI	10.1016/j.rinp.2019.102446
英文摘要	A surface plasmon interference lithography technique to fabricate subwavelength circular grating by continuous rotating and exposing lithography sample is theoretically demonstrated. Based on the theory of surface plasmon interference lithography in combination with coordinate transformation, the period and contrast of the subwavelength circular grating are analyzed by simulating the corresponding magnetic field intensity distribution. It is believed that this technique can be applied to practical experiments, which provides an interesting alternative for the fabrication of subwavelength circular grating.
资助项目	National Natural Science Foundation of China[61865008]
WOS研究方向	Materials Science ; Physics
语种	英语
出版者	ELSEVIER
WOS记录号	WOS:000485104100055
状态	已发表
内容类型	期刊论文
源URL	[http://119.78.100.223/handle/2XXMBERH/31608]
专题	理学院
通讯作者	Wang, Xiangxian
作者单位	1.Lanzhou Univ Technol, Sch Sci, Lanzhou 730050, Gansu, Peoples R China 2.Northwest Normal Univ, Coll Phys & Elect Engn, Lanzhou 730070, Gansu, Peoples R China
推荐引用方式 GB/T 7714	Wang, Xiangxian,Pang, Zhiyuan,Yang, Hua,et al. Theoretical study of subwavelength circular grating fabrication based on continuously exposed surface plasmon interference lithography[J]. RESULTS IN PHYSICS,2019,14.
APA	Wang, Xiangxian,Pang, Zhiyuan,Yang, Hua,&Qi, Yunping.(2019).Theoretical study of subwavelength circular grating fabrication based on continuously exposed surface plasmon interference lithography.RESULTS IN PHYSICS,14.
MLA	Wang, Xiangxian,et al."Theoretical study of subwavelength circular grating fabrication based on continuously exposed surface plasmon interference lithography".RESULTS IN PHYSICS 14(2019).